Unknown

Dataset Information

0

An Investigation of the Non-selective Etching of Synthetic Polymers by Electrospray Droplet Impact/Secondary Ion Mass Spectrometry (EDI/SIMS).


ABSTRACT: Among the various types of cluster secondary ion mass spectrometry (SIMS), electrospray droplet impact/secondary ion mass spectrometry (EDI/SIMS) is unique due to its high ionization efficiency and non-selective atomic/molecular-level surface etching ability. In this study, EDI/SIMS was applied to the non-selective etching of synthetic polymers of polystyrene (PS) and poly(9,9-di-n-octylfluonyl-2,7diyl) (PFO) deposited on a silicon substrate. The polymers gave characteristic fragment ions and the mass spectra remained unchanged with prolonged EDI irradiation time, indicating that non-selective etching can be achieved by EDI irradiation, a finding that is consistent with our previous reports based on EDI/X-ray photoelectron spectroscopy analyses. From the irradiation time and film thickness, the etching rates for PS and PFO were roughly estimated to be 0.6 nm/min and 0.15 nm/min, respectively, under the experimental conditions that were used. After the depletion of polymer sample on the surface, ion signals originating from the exposed silicon substrate were observed. This indicates that EDI/SIMS is applicable to the analysis of the interface of multilayered films composed of organic and inorganic materials.

SUBMITTER: Hiraoka K 

PROVIDER: S-EPMC10209658 | biostudies-literature | 2023

REPOSITORIES: biostudies-literature

altmetric image

Publications

An Investigation of the Non-selective Etching of Synthetic Polymers by Electrospray Droplet Impact/Secondary Ion Mass Spectrometry (EDI/SIMS).

Hiraoka Kenzo K   Sakai Yuji Y   Kubota Hiroyuki H   Ninomiya Satoshi S   Rankin-Turner Stephanie S  

Mass spectrometry (Tokyo, Japan) 20230131 1


Among the various types of cluster secondary ion mass spectrometry (SIMS), electrospray droplet impact/secondary ion mass spectrometry (EDI/SIMS) is unique due to its high ionization efficiency and non-selective atomic/molecular-level surface etching ability. In this study, EDI/SIMS was applied to the non-selective etching of synthetic polymers of polystyrene (PS) and poly(9,9-di-<i>n</i>-octylfluonyl-2,7diyl) (PFO) deposited on a silicon substrate. The polymers gave characteristic fragment ions  ...[more]

Similar Datasets

| S-EPMC4165461 | biostudies-literature
| S-EPMC6824543 | biostudies-literature
| S-EPMC5388367 | biostudies-literature
| S-EPMC6523221 | biostudies-literature
| S-EPMC2861838 | biostudies-literature
| S-EPMC2706321 | biostudies-literature
| S-EPMC5173454 | biostudies-literature
| S-EPMC5031634 | biostudies-literature
| S-EPMC6271531 | biostudies-literature
| S-EPMC8109779 | biostudies-literature