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Scanning probe block copolymer lithography.

ABSTRACT: Integration of individual nanoparticles into desired spatial arrangements over large areas is a prerequisite for exploiting their unique electrical, optical, and chemical properties. However, positioning single sub-10-nm nanoparticles in a specific location individually on a substrate remains challenging. Herein we have developed a unique approach, termed scanning probe block copolymer lithography, which enables one to control the growth and position of individual nanoparticles in situ. This technique relies on either dip-pen nanolithography (DPN) or polymer pen lithography (PPL) to transfer phase-separating block copolymer inks in the form of 100 or more nanometer features on an underlying substrate. Reduction of the metal ions via plasma results in the high-yield formation of single crystal nanoparticles per block copolymer feature. Because the size of each feature controls the number of metal atoms within it, the DPN or PPL step can be used to control precisely the size of each nanocrystal down to 4.8 ± 0.2 nm.

SUBMITTER: Chai J

PROVIDER: S-EPMC2996692 | biostudies-literature | 2010 Nov

REPOSITORIES: biostudies-literature

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Scanning probe block copolymer lithography.

Chai Jinan J Huo Fengwei F Zheng Zijian Z Giam Louise R LR Shim Wooyoung W Mirkin Chad A CA

Proceedings of the National Academy of Sciences of the United States of America 20101108 47

Integration of individual nanoparticles into desired spatial arrangements over large areas is a prerequisite for exploiting their unique electrical, optical, and chemical properties. However, positioning single sub-10-nm nanoparticles in a specific location individually on a substrate remains challenging. Herein we have developed a unique approach, termed scanning probe block copolymer lithography, which enables one to control the growth and position of individual nanoparticles in situ. This tec ...[more]

PMID: 21059942

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Project description:The directed self-assembly (DSA) of block copolymers (BCPs) is a promising low-cost approach to patterning structures with critical dimensions (CDs) which are smaller than can be achieved by traditional photolithography. The CD of contact holes can be reduced by assembling a cylindrical BCP inside a patterned template and utilizing the native size of the cylinder to dictate the reduced dimensions of the hole. This is a particularly promising application of the DSA technique, but in order for this technology to be realized there is a need for three-dimensional metrology of the internal structure of the patterned BCP in order to understand how template properties and processing conditions impact BCP assembly. This is a particularly challenging problem for traditional metrologies owing to the three-dimensional nature of the structure and the buried features. By utilizing small-angle X-ray scattering and changing the angle between the incident beam and sample we can reconstruct the three-dimensional shape profile of the empty template and the residual polymer after self-assembly and removal of one of the phases. A two-dimensional square grid pattern of the holes results in scattering in both in-plane directions, which is simplified by converting to a radial geometry. The shape is then determined by simulating the scattering from a model and iterating that model until the simulated and experimental scattering profiles show a satisfactory match. Samples with two different processing conditions are characterized in order to demonstrate the ability of the technique to evaluate critical features such as residual layer thickness and sidewall height. It was found that the samples had residual layer thicknesses of 15.9 ± 3.2 nm and 4.5 ± 2.2 nm, which were clearly distinguished between the two different DSA processes and in good agreement with focused ion beam scanning transmission electron microscopy (FIBSTEM) observations. The advantage of the X-ray measurements is that FIBSTEM characterizes around ten holes, while there are of the order of 800 000 holes illuminated by the X-ray beam.

Dataset Information

Scanning probe block copolymer lithography.

Publications

Scanning probe block copolymer lithography.

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