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A facile process for soak-and-peel delamination of CVD graphene from substrates using water.


ABSTRACT: We demonstrate a simple technique to transfer chemical vapour deposited (CVD) graphene from copper and platinum substrates using a soak-and-peel delamination technique utilizing only hot deionized water. The lack of chemical etchants results in cleaner CVD graphene films minimizing unintentional doping, as confirmed by Raman and electrical measurements. The process allows the reuse of substrates and hence can enable the use of oriented substrates for growth of higher quality graphene, and is an inherently inexpensive and scalable process for large-area production.

SUBMITTER: Gupta P 

PROVIDER: S-EPMC3900997 | biostudies-literature | 2014 Jan

REPOSITORIES: biostudies-literature

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A facile process for soak-and-peel delamination of CVD graphene from substrates using water.

Gupta Priti P   Dongare Pratiksha D PD   Grover Sameer S   Dubey Sudipta S   Mamgain Hitesh H   Bhattacharya Arnab A   Deshmukh Mandar M MM  

Scientific reports 20140124


We demonstrate a simple technique to transfer chemical vapour deposited (CVD) graphene from copper and platinum substrates using a soak-and-peel delamination technique utilizing only hot deionized water. The lack of chemical etchants results in cleaner CVD graphene films minimizing unintentional doping, as confirmed by Raman and electrical measurements. The process allows the reuse of substrates and hence can enable the use of oriented substrates for growth of higher quality graphene, and is an  ...[more]

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