Ontology highlight
ABSTRACT:
SUBMITTER: Cheng L
PROVIDER: S-EPMC4134179 | biostudies-literature | 2014 Aug
REPOSITORIES: biostudies-literature
ACS applied materials & interfaces 20140721 15
We present an Al2O3 dielectric layer on molybdenum disulfide (MoS2), deposited using atomic layer deposition (ALD) with ozone/trimethylaluminum (TMA) and water/TMA as precursors. The results of atomic force microscopy and low-energy ion scattering spectroscopy show that using TMA and ozone as precursors leads to the formation of uniform Al2O3 layers, in contrast to the incomplete coverage we observe when using TMA/H2O as precursors. Our Raman and X-ray photoelectron spectroscopy measurements ind ...[more]