Ontology highlight
ABSTRACT:
SUBMITTER: Hiller D
PROVIDER: S-EPMC6009393 | biostudies-literature | 2018
REPOSITORIES: biostudies-literature
Beilstein journal of nanotechnology 20180518
Phosphorus- and boron-doped silicon nanocrystals (Si NCs) embedded in silicon oxide matrix can be fabricated by plasma-enhanced chemical vapour deposition (PECVD). Conventionally, SiH<sub>4</sub> and N<sub>2</sub>O are used as precursor gasses, which inevitably leads to the incorporation of ≈10 atom % nitrogen, rendering the matrix a silicon oxynitride. Alternatively, SiH<sub>4</sub> and O<sub>2</sub> can be used, which allows for completely N-free silicon oxide. In this work, we investigate the ...[more]