Boron-Implanted Silicon Substrates for Physical Adsorption of DNA Origami.

ABSTRACT: DNA nanostructures routinely self-assemble with sub-10 nm feature sizes. This capability has created industry interest in using DNA as a lithographic mask, yet with few exceptions, solution-based deposition of DNA nanostructures has remained primarily academic to date. En route to controlled adsorption of DNA patterns onto manufactured substrates, deposition and placement of DNA origami has been demonstrated on chemically functionalized silicon substrates. While compelling, chemical functionalization adds fabrication complexity that limits mask efficiency and hence industry adoption. As an alternative, we developed an ion implantation process that tailors the surface potential of silicon substrates to facilitate adsorption of DNA nanostructures without the need for chemical functionalizati

SUBMITTER: Takabayashi S 

PROVIDER: S-EPMC6165417 | biostudies-literature | 2018 Aug

REPOSITORIES: biostudies-literature