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Plasma Processing with Fluorine Chemistry for Modification of Surfaces Wettability.

ABSTRACT: Using plasma in conjunction with fluorinated compounds is widely encountered in material processing. We discuss several plasma techniques for surface fluorination: deposition of fluorocarbon thin films either by magnetron sputtering of polytetrafluoroethylene targets, or by plasma-assisted chemical vapor deposition using tetrafluoroethane as a precursor, and modification of carbon nanowalls by plasma treatment in a sulphur hexafluoride environment. We showed that conformal fluorinated thin films can be obtained and, according to the initial surface properties, superhydrophobic surfaces can be achieved.

SUBMITTER: Satulu V

PROVIDER: S-EPMC6273439 | biostudies-literature | 2016 Dec

REPOSITORIES: biostudies-literature

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Plasma Processing with Fluorine Chemistry for Modification of Surfaces Wettability.

Satulu Veronica V Ionita Maria Daniela MD Vizireanu Sorin S Mitu Bogdana B Dinescu Gheorghe G

Molecules (Basel, Switzerland) 20161213 12

Using plasma in conjunction with fluorinated compounds is widely encountered in material processing. We discuss several plasma techniques for surface fluorination: deposition of fluorocarbon thin films either by magnetron sputtering of polytetrafluoroethylene targets, or by plasma-assisted chemical vapor deposition using tetrafluoroethane as a precursor, and modification of carbon nanowalls by plasma treatment in a sulphur hexafluoride environment. We showed that conformal fluorinated thin films ...[more]

PMID: 27983598

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