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Vertical WS2/SnS2 van der Waals Heterostructure for Tunneling Transistors.


ABSTRACT: Van der Waals heterostructures composed of two-dimensional (2D) transition metal dichalcogenides (TMD) materials have stimulated tremendous research interest in various device applications, especially in energy-efficient future-generation electronics. Such ultra-thin stacks as tunnel junction theoretically present unprecedented possibilities of tunable relative band alignment and pristine interfaces, which enable significant performance enhancement for steep-slope tunneling transistors. In this work, the optimal 2D-2D heterostructure for tunneling transistors is presented and elaborately engineered, taking into consideration both electric properties and material stability. The key challenges, including band alignment and metal-to-2D semiconductor contact resistances, are optimized separately for integration. By using a new dry transfer technique for the vertical stack, the selected WS2/SnS2 heterostructure-based tunneling transistor is fabricated for the first time, and exhibits superior performance with comparable on-state current and steeper subthreshold slope than conventional FET, as well as on-off current ratio over 106 which is among the highest value of 2D-2D tunneling transistors. A visible negative differential resistance feature is also observed. This work shows the great potential of 2D layered semiconductors for new heterostructure devices and can guide possible development of energy-efficient future-generation electronics.

SUBMITTER: Wang J 

PROVIDER: S-EPMC6288168 | biostudies-literature | 2018 Dec

REPOSITORIES: biostudies-literature

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Vertical WS<sub>2</sub>/SnS<sub>2</sub> van der Waals Heterostructure for Tunneling Transistors.

Wang Jiaxin J   Jia Rundong R   Huang Qianqian Q   Pan Chen C   Zhu Jiadi J   Wang Huimin H   Chen Cheng C   Zhang Yawen Y   Yang Yuchao Y   Song Haisheng H   Miao Feng F   Huang Ru R  

Scientific reports 20181210 1


Van der Waals heterostructures composed of two-dimensional (2D) transition metal dichalcogenides (TMD) materials have stimulated tremendous research interest in various device applications, especially in energy-efficient future-generation electronics. Such ultra-thin stacks as tunnel junction theoretically present unprecedented possibilities of tunable relative band alignment and pristine interfaces, which enable significant performance enhancement for steep-slope tunneling transistors. In this  ...[more]

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