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Dataset on large area nano-crystalline graphite film (NCG) grown on SiO₂ using plasma-enhanced chemical vapour deposition.

ABSTRACT: A Si wafer coated with a low temperature oxide (LTO) was used as substrate (Si/SiO₂) during the deposition of a thick nano-crystalline graphite (NCG) film by means of plasma-enhanced chemical vapour deposition (PECVD) procedure. The process parameters, the atomic force (AFM) and scanning electron (SEM) micrographs, Raman spectrum and X-ray diffraction (XRD) pattern are herein illustrated. The as deposited NCG film was electrochemically pretreated (3 mA applied current, during 240 s, in 10 mM phosphate buffer saline (PBS) solution containing 0.1 M KCl, pH 7) and thereafter used as electrode for sensing the caffeic acid content in lyophilised berries and dried chokeberries in "Nano-crystalline graphite film on SiO₂: Electrochemistry and electro-analytical application" [1].

SUBMITTER: Albu C

PROVIDER: S-EPMC6484281 | biostudies-literature | 2019 Jun

REPOSITORIES: biostudies-literature

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Dataset on large area nano-crystalline graphite film (NCG) grown on SiO2 using plasma-enhanced chemical vapour deposition.

Albu Camelia C Eremia Sandra A V SAV Veca Monica Lucia ML Veca Monica Lucia ML Avram Andrei A Popa Radu Cristian RC Pachiu Cristina C Romanitan Cosmin C Kusko Mihaela M Gavrila Raluca R Radoi Antonio A

Data in brief 20190416

A Si wafer coated with a low temperature oxide (LTO) was used as substrate (Si/SiO2) during the deposition of a thick nano-crystalline graphite (NCG) film by means of plasma-enhanced chemical vapour deposition (PECVD) procedure. The process parameters, the atomic force (AFM) and scanning electron (SEM) micrographs, Raman spectrum and X-ray diffraction (XRD) pattern are herein illustrated. The as deposited NCG film was electrochemically pretreated (3 mA applied current, during 240 s, i ...[more]

PMID: 31049377

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