Analytical level set fabrication constraints for inverse design.

ABSTRACT: Inverse design methods produce nanophotonic devices with arbitrary geometries that show high efficiencies as well as novel functionalities. Ensuring fabricability during optimization of these unrestricted device geometries is a major challenge for these design methods. In this work, we construct a fabrication constraint penalty function for level set geometry representations of these devices. This analytical penalty function limits both the gap size and boundary curvature of a device. We incorporate this penalty in a fully automated optical design flow using a quasi-Newton optimization method. The performance of our design method is evaluated by designing a series of waveguide demultiplexers (WDM) and mode converters with various footprints and minimum feature sizes. Finally, we design and experimentally characterize three WDMs with a 80 nm, 120 nm and 160 nm feature size.

SUBMITTER: Vercruysse D 

PROVIDER: S-EPMC6588594 | biostudies-literature | 2019 Jun

REPOSITORIES: biostudies-literature