Dataset Information

Facile Approach to Recycling Highly Cross-Linked Thermoset Silicone Resins under Ambient Conditions.

ABSTRACT: Silicone resins are traditional thermoset polymers with an inorganic backbone, affording chemical inertness and high thermal stability, which also makes them inherently difficult to recycle by traditional methods. Here, we demonstrate that catalytic amounts of fluoride ion at room temperature solubilize highly cross-linked silicone resins initially cured up to 250 °C. After solubilization equilibria are achieved, solvent is removed to reform the polymer network. Coatings on aluminum substrates and monoliths of virgin and recycled silicone resins were evaluated for hydrophobicity, wear resistance, substrate adhesion, and thermal stability. Silicones recycled under optimized conditions retained nearly 100% wear resistance, thermal stability, and adhesion properties. In some instances, the recycled coatings offer properties superior to the initial materials.

SUBMITTER: Krug DJ

PROVIDER: S-EPMC6649146 | biostudies-literature | 2019 Feb

REPOSITORIES: biostudies-literature

ACCESS DATA

Publications

Facile Approach to Recycling Highly Cross-Linked Thermoset Silicone Resins under Ambient Conditions.

Krug David J DJ Asuncion Michael Z MZ Laine Richard M RM

ACS omega 20190220 2

Silicone resins are traditional thermoset polymers with an inorganic backbone, affording chemical inertness and high thermal stability, which also makes them inherently difficult to recycle by traditional methods. Here, we demonstrate that catalytic amounts of fluoride ion at room temperature solubilize highly cross-linked silicone resins initially cured up to 250 °C. After solubilization equilibria are achieved, solvent is removed to reform the polymer network. Coatings on aluminum substrates a ...[more]

PMID: 31459590

Similar Datasets

Project description:Photoresists (or photo-resins) are the main and most important raw material used for lithography techniques such as deep X-ray (DXRL), ultraviolet (UVL), deep-UV (DUVL), and extreme UV (EUVL). In previous work, we showed how complicated could be the synthesis of the resins used to produce photoresist. In this study, we follow up on the strategy of tuning deep and macro levels of properties to formulate photo-resins. They were developed from a primary basis, using epoxy resins, a solvent, and a photoinitiator in several concentrations. The formulations were evaluated initially by the UVL technique, using a squared pattern of 2.3 mm2. The most suitable compositions were then studied in a pattern structure varying from 50 down to 1 µm width, applying UVL and DUVL. The patterned structures were compared with the chemical composition of the photo-resins. Considering the deep level of properties, polydispersion, and epoxidation degree were evaluated. Regarding the macro level of properties, the concentration of photoinitiator was studied. Promising results have been achieved with the control of the deep and macro levels methodology. By means of UV lithography, it was possible to note, for a large feature size above 2.0 mm2, the formulations presented good quality structures with a broad range of epoxidation degrees and photoinitiator concentrations, respectively from 3 to 100% (mol·molpolymer-1) and from 10 to 40% (mol·molpolymer-1). For structures smaller than 50 µm width, the composition of the photo-resins may be restricted to a narrow range of values regarding the formulation. The results indicate that the polydispersion of the oligomers might be a significant property to control. There is a tendency to better outcome with a low polydispersity (resins P1 and P2). Regarding UV and deep-UV irradiation, the best results were achieved with UV. Nevertheless, for DUV, the sensitivity seems to be more intense, leading to well-defined structures with over-exposure effects.

Dataset Information

Facile Approach to Recycling Highly Cross-Linked Thermoset Silicone Resins under Ambient Conditions.

Publications

Facile Approach to Recycling Highly Cross-Linked Thermoset Silicone Resins under Ambient Conditions.

Similar Datasets

OmicsDI is part of the ELIXIR infrastructure

Tweets