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Fast fitting of reflectivity data of growing thin films using neural networks.


ABSTRACT: X-ray reflectivity (XRR) is a powerful and popular scattering technique that can give valuable insight into the growth behavior of thin films. This study shows how a simple artificial neural network model can be used to determine the thickness, roughness and density of thin films of different organic semiconductors [diindenoperylene, copper(II) phthalocyanine and ?-sexithiophene] on silica from their XRR data with millisecond computation time and with minimal user input or a priori knowledge. For a large experimental data set of 372 XRR curves, it is shown that a simple fully connected model can provide good results with a mean absolute percentage error of 8-18% when compared with the results obtained by a genetic least mean squares fit using the classical Parratt formalism. Furthermore, current drawbacks and prospects for improvement are discussed.

SUBMITTER: Greco A 

PROVIDER: S-EPMC6878882 | biostudies-literature | 2019 Dec

REPOSITORIES: biostudies-literature

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Fast fitting of reflectivity data of growing thin films using neural networks.

Greco Alessandro A   Starostin Vladimir V   Karapanagiotis Christos C   Hinderhofer Alexander A   Gerlach Alexander A   Pithan Linus L   Liehr Sascha S   Schreiber Frank F   Kowarik Stefan S  

Journal of applied crystallography 20191108 Pt 6


X-ray reflectivity (XRR) is a powerful and popular scattering technique that can give valuable insight into the growth behavior of thin films. This study shows how a simple artificial neural network model can be used to determine the thickness, roughness and density of thin films of different organic semiconductors [diindenoperylene, copper(II) phthalocyanine and α-sexithiophene] on silica from their XRR data with millisecond computation time and with minimal user input or <i>a priori</i> knowle  ...[more]

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