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Facile Process for Surface Passivation Using (NH4)2S for the InP MOS Capacitor with ALD Al2O3.

ABSTRACT: Ammonium sulfide ((NH4)2S) was used for the passivation of an InP (100) substrate and its conditions were optimized. The capacitance-voltage (C-V) characteristics of InP metal-oxide-semiconductor (MOS) capacitors were analyzed by changing the concentration of and treatment time with (NH4)2S. It was found that a 10% (NH4)2S treatment for 10 min exhibits the best electrical properties in terms of hysteresis and frequency dispersions in the depletion or accumulation mode. After the InP substrate was passivated by the optimized (NH4)2S, the results of x-ray photoelectron spectroscopy (XPS) and the extracted interface trap density (Dit) proved that the growth of native oxide was suppressed.

SUBMITTER: Lee JS

PROVIDER: S-EPMC6926807 | biostudies-literature | 2019 Nov

REPOSITORIES: biostudies-literature

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Facile Process for Surface Passivation Using (NH4)2S for the InP MOS Capacitor with ALD Al2O3.

Lee Jung Sub JS Ahn Tae Young TY Kim Daewon D

Materials (Basel, Switzerland) 20191127 23

Ammonium sulfide ((NH4)2S) was used for the passivation of an InP (100) substrate and its conditions were optimized. The capacitance-voltage (C-V) characteristics of InP metal-oxide-semiconductor (MOS) capacitors were analyzed by changing the concentration of and treatment time with (NH4)2S. It was found that a 10% (NH4)2S treatment for 10 min exhibits the best electrical properties in terms of hysteresis and frequency dispersions ...[more]

PMID: 31783497

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