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In Situ Observation of Crystalline Silicon Growth from SiO2 at Atomic Scale.


ABSTRACT: The growth of crystalline Si (c-Si) via direct electron beam writing shows promise for fabricating Si nanomaterials due to its ultrahigh resolution. However, to increase the writing speed is a major obstacle, due to the lack of systematic experimental explorations of the growth process and mechanisms. This paper reports a systematic experimental investigation of the beam-induced formation of c-Si nanoparticles (NPs) from amorphous SiO2 under a range of doses and temperatures by in situ transmission electron microscopy at the atomic scale. A three-orders-of-magnitude writing speed-up is identified under 80?keV irradiation at 600°C compared with 300?keV irradiation at room temperature. Detailed analysis reveals that the self-organization of c-Si NPs is driven by reduction of c-Si effective free energy under electron irradiation. This study provides new insights into the formation mechanisms of c-Si NPs during direct electron beam writing and suggests methods to improve the writing speed.

SUBMITTER: Yu K 

PROVIDER: S-EPMC6944520 | biostudies-literature | 2019

REPOSITORIES: biostudies-literature

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In Situ Observation of Crystalline Silicon Growth from SiO<sub>2</sub> at Atomic Scale.

Yu Kaihao K   Xu Tao T   Wu Xing X   Wang Wen W   Zhang Hui H   Zhang Qiubo Q   Tang Luping L   Sun Litao L  

Research (Washington, D.C.) 20191030


The growth of crystalline Si (c-Si) via direct electron beam writing shows promise for fabricating Si nanomaterials due to its ultrahigh resolution. However, to increase the writing speed is a major obstacle, due to the lack of systematic experimental explorations of the growth process and mechanisms. This paper reports a systematic experimental investigation of the beam-induced formation of c-Si nanoparticles (NPs) from amorphous SiO<sub>2</sub> under a range of doses and temperatures by in sit  ...[more]

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