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Artificial 2D van der Waals Synapse Devices via Interfacial Engineering for Neuromorphic Systems.


ABSTRACT: Despite extensive investigations of a wide variety of artificial synapse devices aimed at realizing a neuromorphic hardware system, the identification of a physical parameter that modulates synaptic plasticity is still required. In this context, a novel two-dimensional architecture consisting of a NbSe2/WSe2/Nb2O5 heterostructure placed on an SiO2/p+ Si substrate was designed to overcome the limitations of the conventional silicon-based complementary metal-oxide semiconductor technology. NbSe2, WSe2, and Nb2O5 were used as the metal electrode, active channel, and conductance-modulating layer, respectively. Interestingly, it was found that the post-synaptic current was successfully modulated by the thickness of the interlayer Nb2O5, with a thicker interlayer inducing a higher synapse spike current and a stronger interaction in the sequential pulse mode. Introduction of the Nb2O5 interlayer can facilitate the realization of reliable and controllable synaptic devices for brain-inspired integrated neuromorphic systems.

SUBMITTER: Park W 

PROVIDER: S-EPMC7022853 | biostudies-literature | 2020 Jan

REPOSITORIES: biostudies-literature

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Artificial 2D van der Waals Synapse Devices via Interfacial Engineering for Neuromorphic Systems.

Park Woojin W   Jang Hye Yeon HY   Nam Jae Hyeon JH   Kwon Jung-Dae JD   Cho Byungjin B   Kim Yonghun Y  

Nanomaterials (Basel, Switzerland) 20200102 1


Despite extensive investigations of a wide variety of artificial synapse devices aimed at realizing a neuromorphic hardware system, the identification of a physical parameter that modulates synaptic plasticity is still required. In this context, a novel two-dimensional architecture consisting of a NbSe<sub>2</sub>/WSe<sub>2</sub>/Nb<sub>2</sub>O<sub>5</sub> heterostructure placed on an SiO<sub>2</sub>/p+ Si substrate was designed to overcome the limitations of the conventional silicon-based comp  ...[more]

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