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Real-time Optical Dimensional Metrology via Diffractometry for Nanofabrication.

ABSTRACT: Surface patterning technologies represent a worldwide growing industry, creating smart surfaces and micro/nanoscale device. The advent of large-area, high-speed imprinting technologies has created an ever-growing need for rapid and non-destructive dimensional metrology techniques to keep pace with the speed of production. Here we present a new real-time optical scatterometry technique, applicable at the mesoscale when optical inspection produces multiple orders of diffraction. We validate this method by inspecting multiple silicon gratings with a variety of structural parameters. These measurements are cross-referenced with FIB, SEM and scanning stylus profilometry. Finally, we measure thermally imprinted structures as a function of imprinting temperature in order to demonstrate the method suitable for in-line quality control in nanoimprint lithography.

SUBMITTER: Whitworth GL

PROVIDER: S-EPMC7096422 | biostudies-literature | 2020 Mar

REPOSITORIES: biostudies-literature

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Real-time Optical Dimensional Metrology via Diffractometry for Nanofabrication.

Whitworth Guy L GL Francone Achille A Sotomayor-Torres Clivia M CM Kehagias Nikolaos N

Scientific reports 20200325 1

Surface patterning technologies represent a worldwide growing industry, creating smart surfaces and micro/nanoscale device. The advent of large-area, high-speed imprinting technologies has created an ever-growing need for rapid and non-destructive dimensional metrology techniques to keep pace with the speed of production. Here we present a new real-time optical scatterometry technique, applicable at the mesoscale when optical inspection produces multiple orders of diffraction. We validate this m ...[more]

PMID: 32214137

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