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Exploring an Approach toward the Intrinsic Limits of GaN Electronics.


ABSTRACT: To fully exploit the advantages of GaN for electronic devices, a critical electric field that approaches its theoretical value (3 MV/cm) is desirable but has not yet been achieved. It is necessary to explore a new approach toward the intrinsic limits of GaN electronics from the perspective of epitaxial growth. By using a novel two-dimensional growth mode benefiting from our high-temperature AlN buffer technology, which is different from the classic two-step growth approach, our high-electron-mobility transistors (HEMTs) demonstrate an extremely high breakdown field of 2.5 MV/cm approaching the theoretical limit of GaN and an extremely low off-state buffer leakage of 1 nA/mm at a bias of up to 1000 V. Furthermore, our HEMTs also exhibit an excellent figure-of-merit (Vbr2/Ron,sp) of 5.13 × 108 V2/?·cm2.

SUBMITTER: Jiang S 

PROVIDER: S-EPMC7146752 | biostudies-literature | 2020 Mar

REPOSITORIES: biostudies-literature

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Exploring an Approach toward the Intrinsic Limits of GaN Electronics.

Jiang Sheng S   Cai Yuefei Y   Feng Peng P   Shen Shuoheng S   Zhao Xuanming X   Fletcher Peter P   Esendag Volkan V   Lee Kean-Boon KB   Wang Tao T  

ACS applied materials & interfaces 20200305 11


To fully exploit the advantages of GaN for electronic devices, a critical electric field that approaches its theoretical value (3 MV/cm) is desirable but has not yet been achieved. It is necessary to explore a new approach toward the intrinsic limits of GaN electronics from the perspective of epitaxial growth. By using a novel two-dimensional growth mode benefiting from our high-temperature AlN buffer technology, which is different from the classic two-step growth approach, our high-electron-mob  ...[more]

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