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Strong Linear Correlation between CH3NH2 Molecular Defect and THz-Wave Absorption in CH3NH3PbI3 Hybrid Perovskite Thin Film.


ABSTRACT: To control the density of a CH3NH2 molecular defect, which strongly contributed to a significant THz-wave absorption property in the CH3NH3PbI3 hybrid perovskite thin film formed by the sequential vacuum evaporation method, we performed post-annealing processes with various temperatures and times. In the thin film after post-annealing at 110 °C for 45 min, the density of the CH3NH2 molecular defect was minimized, and CH3NH3I and PbI2 disappeared in the thin film after the post-annealing process at 150 °C for 30 min. However, the density of the CH3NH2 molecular defect increased. Moreover, the THz-wave absorption property for each thin film was obtained using a THz time-domain spectroscopy to understand the correlation between the density of a molecular defect and the THz-wave oscillation strength at 1.6 THz, which originated in the molecular defect-incorporated hybrid perovskite structure. There is a strong linear correlation between the oscillator strength of a significant THz-wave absorption at 1.6 THz and the CH3NH2 molecular defect density.

SUBMITTER: Maeng I 

PROVIDER: S-EPMC7221770 | biostudies-literature | 2020 Apr

REPOSITORIES: biostudies-literature

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Strong Linear Correlation between CH<sub>3</sub>NH<sub>2</sub> Molecular Defect and THz-Wave Absorption in CH<sub>3</sub>NH<sub>3</sub>PbI<sub>3</sub> Hybrid Perovskite Thin Film.

Maeng Inhee I   Matsuyama Asuka A   Yun Jung-Ho JH   Wang Shenghao S   Kang Chul C   Kee Chul-Sik CS   Nakamura Masakazu M   Jung Min-Cherl MC  

Nanomaterials (Basel, Switzerland) 20200410 4


To control the density of a CH<sub>3</sub>NH<sub>2</sub> molecular defect, which strongly contributed to a significant THz-wave absorption property in the CH<sub>3</sub>NH<sub>3</sub>PbI<sub>3</sub> hybrid perovskite thin film formed by the sequential vacuum evaporation method, we performed post-annealing processes with various temperatures and times. In the thin film after post-annealing at 110 °C for 45 min, the density of the CH<sub>3</sub>NH<sub>2</sub> molecular defect was minimized, and CH  ...[more]

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