Unknown

Dataset Information

0

Dataset for TiN Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(dimethylamino)titanium (TDMAT) and Titanium Tetrachloride (TiCl4) Precursor.

ABSTRACT: A dataset in this report is regarding an article "Ultrathin Effective TiN Protective Films Prepared by Plasma-Enhanced Atomic Layer Deposition for High Performance Metallic Bipolar Plates of Polymer Electrolyte Membrane Fuel Cells" [1]. TiN (Titanium Nitride) thin films were deposited by Plasma-Enhanced Atomic Layer Deposition (PEALD) method using well known two types of precursor: using tetrakis(dimethylamino)titanium (TDMAT) and titanium tetrachloride (TiCl4), and plasma. Summarized reports, growth characteristics (growth rate as a function of each precursor pulse time, plasma power, precursor and plasma purge time, thickness depending on the number of PEALD cycles), each precursor structural information and the atomic force micrographs (AFM) data are herein demonstrated. For TDMAT-TiN, N2 plasma was used as a reactant whereas, H2+N2 plasma was used as TiCl4-TiN reactant. To apply the bipolar plate substrate, two types of TiN thin films were introduced into Stainless steel (SUS) 316L.

SUBMITTER: Lee WJ 

PROVIDER: S-EPMC7287241 | biostudies-literature | 2020 Aug

REPOSITORIES: biostudies-literature

Json Xml
altmetric image

Publications

Dataset for TiN Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(dimethylamino)titanium (TDMAT) and Titanium Tetrachloride (TiCl<sub>4</sub>) Precursor.

Lee Woo-Jae WJ   Yun Eun-Young EY   Lee Han-Bo-Ram HB   Hong Suck Won SW   Kwon Se-Hun SH  

Data in brief 20200528

A dataset in this report is regarding an article "Ultrathin Effective TiN Protective Films Prepared by Plasma-Enhanced Atomic Layer Deposition for High Performance Metallic Bipolar Plates of Polymer Electrolyte Membrane Fuel Cells" [1]. TiN (Titanium Nitride) thin films were deposited by Plasma-Enhanced Atomic Layer Deposition (PEALD) method using well known two types of precursor: using tetrakis(dimethylamino)titanium (TDMAT) and titanium tetrachloride (TiCl<sub>4</sub>), and plasma. Summarized  ...[more]

Similar Datasets

Unknown A Comparative Study on the Ferroelectric Performances in Atomic Layer Deposited Hf0.5Zr0.5O2 Thin Films Using Tetrakis(ethylmethylamino) and Tetrakis(dimethylamino) Precursors.
| S-EPMC7138889 | biostudies-literature
Unknown Data set for fabrication of conformal two-dimensional TiO2 by atomic layer deposition using tetrakis (dimethylamino) titanium (TDMAT) and H2O precursors.
| S-EPMC5480828 | biostudies-other
Unknown Atomic Layer Deposition of Photoconductive Cu<sub>2</sub>O Thin Films.
| S-EPMC6648912 | biostudies-literature
Unknown Photocatalytic hollow TiO<sub>2</sub> and ZnO nanospheres prepared by atomic layer deposition.
| S-EPMC5489517 | biostudies-literature
Unknown Ni<sub>80</sub>Fe<sub>20</sub> nanotubes with optimized spintronic functionalities prepared by atomic layer deposition.
| S-EPMC8359140 | biostudies-literature
Unknown Adsorption of Titanium Tetrachloride on Magnesium Dichloride Clusters.
| S-EPMC6645071 | biostudies-literature
Unknown Atomic Layer Deposition of Ternary Indium/Tin/Aluminum Oxide Thin Films, Their Characterization and Transistor Performance under Illumination.
| S-EPMC8362207 | biostudies-literature
Unknown Palladium-catalyzed borylation of aryl and heteroaryl halides utilizing tetrakis(dimethylamino)diboron: one step greener.
| S-EPMC3464102 | biostudies-literature
Unknown Partial Atomic Tin Nanocomplex Pillared Few-Layered Ti<sub>3</sub>C<sub>2</sub>T<sub>x</sub> MXenes for Superior Lithium-Ion Storage.
| S-EPMC7770861 | biostudies-literature
Unknown Resistive Switching Characteristics of HfO<sub>2</sub> Thin Films on Mica Substrates Prepared by Sol-Gel Process.
| S-EPMC6723579 | biostudies-literature