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Optimization of Photogenerated Charge Carrier Lifetimes in ALD Grown TiO2 for Photonic Applications.


ABSTRACT: Titanium dioxide (TiO2) thin films are widely employed for photocatalytic and photovoltaic applications where the long lifetime of charge carriers is a paramount requirement for the device efficiency. To ensure the long lifetime, a high temperature treatment is used which restricts the applicability of TiO2 in devices incorporating organic or polymer components. In this study, we exploited low temperature (100-150 °C) atomic layer deposition (ALD) of 30 nm TiO2 thin films from tetrakis(dimethylamido)titanium. The deposition was followed by a heat treatment in air to find the minimum temperature requirements for the film fabrication without compromising the carrier lifetime. Femto-to nanosecond transient absorption spectroscopy was used to determine the lifetimes, and grazing incidence X-ray diffraction was employed for structural analysis. The optimal result was obtained for the TiO2 thin films grown at 150 °C and heat-treated at as low as 300 °C. The deposited thin films were amorphous and crystallized into anatase phase upon heat treatment at 300-500 °C. The average carrier lifetime for amorphous TiO2 is few picoseconds but increases to >400 ps upon crystallization at 500 °C. The samples deposited at 100 °C were also crystallized as anatase but the carrier lifetime was <100 ps.

SUBMITTER: Khan R 

PROVIDER: S-EPMC7466613 | biostudies-literature | 2020 Aug

REPOSITORIES: biostudies-literature

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Optimization of Photogenerated Charge Carrier Lifetimes in ALD Grown TiO<sub>2</sub> for Photonic Applications.

Khan Ramsha R   Ali-Löytty Harri H   Saari Jesse J   Valden Mika M   Tukiainen Antti A   Lahtonen Kimmo K   Tkachenko Nikolai V NV  

Nanomaterials (Basel, Switzerland) 20200810 8


Titanium dioxide (TiO<sub>2</sub>) thin films are widely employed for photocatalytic and photovoltaic applications where the long lifetime of charge carriers is a paramount requirement for the device efficiency. To ensure the long lifetime, a high temperature treatment is used which restricts the applicability of TiO<sub>2</sub> in devices incorporating organic or polymer components. In this study, we exploited low temperature (100-150 °C) atomic layer deposition (ALD) of 30 nm TiO<sub>2</sub> t  ...[more]

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