ABSTRACT: Densely integrated photonic circuits enable scalable, complex processing of optical signals, including modulation, multiplexing, wavelength conversion, and detection. Directly interfacing such integrated circuits to free-space optical modes will enable novel optical functions, such as chip-scale sensing, interchip free-space interconnect and cooling, trapping, and interrogation of atoms. However, doing this within the limits of planar batch fabrication requires new approaches for bridging the large mode scale mismatch. Here, by integrating a dielectric metasurface with an extreme photonic mode converter, we create a versatile nanophotonic platform for efficient coupling to arbitrary-defined free-space radiation of 780 nm wavelength with well-controlled spatially-dependent polarization, phase, and intensity. Without leaving the chip, the high index photonic mode is converted first to a ? 200 ?m wide, precisely collimated, linearly-polarized Gaussian beam, which is then modified by a planar, integrated, low-loss metasurface. We demonstrate high numerical aperture, diffraction limited focusing to an ? 473 nm spot at an ? 75 ?m working distance, and combine it with simultaneous conversion from linear to elliptical polarization. All device components are lithographically defined and can be batch fabricated, facilitating future chip-scale low-cost hybrid photonic systems for bio-sensing, nonlinear signal processing and atomic quantum sensing, frequency references and memory. Graphical Abstract By integrating a dielectric metasurface with an extreme photonic mode converter, we create a versatile nanophotonic platform for efficient coupling to arbitrary-defined free-space radiation of 780 nm wavelength with well-controlled spatially-dependent polarization, phase, and intensity. The TOC depicts the schematic of our device and an optical micrograph of a diffraction limited focal spot.
