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Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting.


ABSTRACT: Transition-metal phosphides (TMP) prepared by atomic layer deposition (ALD) are reported for the first time. Ultrathin Co-P films were deposited by using PH3 plasma as the phosphorus source and an extra H2 plasma step to remove excess P in the growing films. The optimized ALD process proceeded by self-limited layer-by-layer growth, and the deposited Co-P films were highly pure and smooth. The Co-P films deposited via ALD exhibited better electrochemical and photoelectrochemical hydrogen evolution reaction (HER) activities than similar Co-P films prepared by the traditional post-phosphorization method. Moreover, the deposition of ultrathin Co-P films on periodic trenches was demonstrated, which highlights the broad and promising potential application of this ALD process for a conformal coating of TMP films on complex three-dimensional (3D) architectures.

SUBMITTER: Zhang H 

PROVIDER: S-EPMC7540345 | biostudies-literature | 2020 Jun

REPOSITORIES: biostudies-literature

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Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting.

Zhang Haojie H   Hagen Dirk J DJ   Li Xiaopeng X   Graff Andreas A   Heyroth Frank F   Fuhrmann Bodo B   Kostanovskiy Ilya I   Schweizer Stefan L SL   Caddeo Francesco F   Maijenburg A Wouter AW   Parkin Stuart S   Wehrspohn Ralf B RB  

Angewandte Chemie (International ed. in English) 20200807 39


Transition-metal phosphides (TMP) prepared by atomic layer deposition (ALD) are reported for the first time. Ultrathin Co-P films were deposited by using PH<sub>3</sub> plasma as the phosphorus source and an extra H<sub>2</sub> plasma step to remove excess P in the growing films. The optimized ALD process proceeded by self-limited layer-by-layer growth, and the deposited Co-P films were highly pure and smooth. The Co-P films deposited via ALD exhibited better electrochemical and photoelectrochem  ...[more]

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