Ontology highlight
ABSTRACT:
SUBMITTER: Chen Y
PROVIDER: S-EPMC7578796 | biostudies-literature | 2020 Oct
REPOSITORIES: biostudies-literature
Nature communications 20201021 1
Current techniques of patterned material deposition require separate steps for patterning and material deposition. The complexity and harsh working conditions post serious limitations for fabrication. Here, we introduce a single-step and easy-to-adapt method that can deposit materials in-situ. Its methodology is based on the semiconductor nanoparticle assisted photon-induced chemical reduction and optical trapping. This universal mechanism can be used for depositing a large selection of material ...[more]