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Thin films of formamidinium lead iodide (FAPI) deposited using aerosol assisted chemical vapour deposition (AACVD).

ABSTRACT: Formamidinium lead iodide (CH(NH₂)₂PbI₃, FAPI) thin films have been deposited on glass substrates at 150 °C using ambient pressure aerosol assisted chemical vapour deposition (AACVD). The films have been analysed by a range of techniques including powder X-ray diffraction (pXRD), scanning electron microscopy (SEM), energy dispersive X-ray (EDX) spectroscopy, and UV-Vis-NIR absorption spectroscopy. Sharp reflections in the pXRD pattern can be indexed to the ?-phase of FAPI which confirms the crystallinity of the as-deposited film and reveals a preferred growth orientation along the (002) plane with respect to the substrate. High magnification SEM images show that the thin film is comprised of a network of intimately connected FAPI crystallites which form a mesoporous architecture. EDX mapping of lead and iodine emission peaks show that the Pb and I within these films are spatially co-localised. Optical measurements show as-deposited FAPI films have absorption onsets in the near infra-red with a direct bandgap value of 1.46 eV, suitable for single junction solar cells. Four-point probe measurement of as deposited films show that the electrical conductivity (?) of the FAPI thin film is 5.2?×?10^-7 S/cm, which is similar to FAPI thin films deposited by spin coating technique.

SUBMITTER: Alam F

PROVIDER: S-EPMC7747716 | biostudies-literature | 2020 Dec

REPOSITORIES: biostudies-literature

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Thin films of formamidinium lead iodide (FAPI) deposited using aerosol assisted chemical vapour deposition (AACVD).

Alam Firoz F Lewis David J DJ

Scientific reports 20201217 1

Formamidinium lead iodide (CH(NH2)2PbI3, FAPI) thin films have been deposited on glass substrates at 150 °C using ambient pressure aerosol assisted chemical vapour deposition (AACVD). The films have been analysed by a range of techniques including powder X-ray diffraction (pXRD), scanning electron microscopy (SEM), energy dispersive X-ray (EDX) spectroscopy, and UV-Vis-NIR absorption spectroscopy. Sharp reflections in the pXRD pattern can be indexed to the α-phas ...[more]

PMID: 33335260

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Project description:Cadmium sulfide (CdS) is an important semiconductor for electronic and photovoltaic applications, particularly when utilized as a thin film for window layers in CdTe solar cells. Deposition of thin-film CdS through the decomposition of single-source precursors is an attractive approach due to the facile, low-temperature, and rapid nature of this approach. Tailoring the precursor to affect the decomposition properties is commonly employed to tune desirable temperatures of decomposition. However, altering the precursor structure and the effect this has on the nature of the deposited material is an area far less commonly investigated. Here, we seek to investigate this by altering the ligands around the Cd metal center to increase the steric hindrance of the precursor and investigate the effect this has on the decomposition properties and the properties of deposited thin-film CdS from these precursors. For this, we report the synthesis of four CdS precursors with xanthate and pyridyl ligands ([Cd(n-ethyl xanthate)2(3-methyl pyridine)2] [1], [Cd(n-ethyl xanthate)2(3,5-lutidine)2] [2], [(Cd2(isopropyl xanthate)4(3-methyl pyridine)2)n] [3], and [Cd(isopropyl xanthate)2(3,5-lutidine)2] [4]). These single-source precursors for CdS were fully characterized by elemental analysis, NMR spectroscopy, single-crystal X-ray diffraction (XRD), and thermogravimetric analysis. It was found that even with subtle alterations in the xanthate (n-ethyl to isopropyl) and pyridine (3-methyl and 3,5-dimethyl) ligands, a range of hexa-coordinate precursors were formed (two with cis configuration, one with trans configuration, and one as a one-dimensional (1D) polymer). These four precursors were then used in aerosol-assisted chemical vapor deposition (AACVD) and spin-coating experiments to deposit eight thin films of CdS, which were characterized by Raman spectroscopy, powder X-ray diffraction, and scanning electron microscopy. Comparative quantitative information concerning film thickness and surface roughness was also determined by atomic force microscopy. Finally, the optical properties of all thin films were characterized by ultraviolet-visible (UV-Vis) absorption spectroscopy, from which the band gap of each deposited film was determined to be commensurate with that of bulk CdS (ca. 2.4 eV).

Dataset Information

Thin films of formamidinium lead iodide (FAPI) deposited using aerosol assisted chemical vapour deposition (AACVD).

Publications

Thin films of formamidinium lead iodide (FAPI) deposited using aerosol assisted chemical vapour deposition (AACVD).

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