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Gradient wettability induced by deterministically patterned nanostructures.


ABSTRACT: We report a large-scale surface with continuously varying wettability induced by ordered gradient nanostructures. The gradient pattern is generated from nonuniform interference lithography by utilizing the Gaussian-shaped intensity distribution of two coherent laser beams. We also develop a facile fabrication method to directly transfer a photoresist pattern into an ultraviolet (UV)-cured high-strength replication molding material, which eliminates the need for high-cost reactive ion etching and e-beam evaporation during the mold fabrication process. This facile mold is then used for the reproducible production of surfaces with gradient wettability using thermal-nanoimprint lithography (NIL). In addition, the wetting behavior of water droplets on the surface with the gradient nanostructures and therefore gradient wettability is investigated. A hybrid wetting model is proposed and theoretically captures the contact angle measurement results, shedding light on the wetting behavior of a liquid on structures patterned at the nanoscale.

SUBMITTER: Min S 

PROVIDER: S-EPMC8433471 | biostudies-literature | 2020

REPOSITORIES: biostudies-literature

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Gradient wettability induced by deterministically patterned nanostructures.

Min Siyi S   Li Shijie S   Zhu Zhouyang Z   Li Wei W   Tang Xin X   Liang Chuwei C   Wang Liqiu L   Cheng Xing X   Li Wen-Di WD  

Microsystems & nanoengineering 20201130


We report a large-scale surface with continuously varying wettability induced by ordered gradient nanostructures. The gradient pattern is generated from nonuniform interference lithography by utilizing the Gaussian-shaped intensity distribution of two coherent laser beams. We also develop a facile fabrication method to directly transfer a photoresist pattern into an ultraviolet (UV)-cured high-strength replication molding material, which eliminates the need for high-cost reactive ion etching and  ...[more]

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