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Solvent-free bottom-up patterning of zeolitic imidazolate frameworks.

ABSTRACT: Patterning metal-organic frameworks (MOFs) at submicrometer scale is a crucial yet challenging task for their integration in miniaturized devices. Here we report an electron beam (e-beam) assisted, bottom-up approach for patterning of two MOFs, zeolitic imidazolate frameworks (ZIF), ZIF-8 and ZIF-67. A mild pretreatment of metal oxide precursors with linker vapor leads to the sensitization of the oxide surface to e-beam irradiation, effectively inhibiting subsequent conversion of the oxide to ZIFs in irradiated areas, while ZIF growth in non-irradiated areas is not affected. Well-resolved patterns with features down to the scale of 100 nm can be achieved. This developer-free, all-vapor phase technique will facilitate the incorporation of MOFs in micro- and nanofabrication processes.

SUBMITTER: Miao Y

PROVIDER: S-EPMC8776825 | biostudies-literature | 2022 Jan

REPOSITORIES: biostudies-literature

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Solvent-free bottom-up patterning of zeolitic imidazolate frameworks.

Miao Yurun Y Lee Dennis T DT de Mello Matheus Dorneles MD Ahmad Mueed M Abdel-Rahman Mohammed K MK Eckhert Patrick M PM Boscoboinik J Anibal JA Fairbrother D Howard DH Tsapatsis Michael M

Nature communications 20220120 1

Patterning metal-organic frameworks (MOFs) at submicrometer scale is a crucial yet challenging task for their integration in miniaturized devices. Here we report an electron beam (e-beam) assisted, bottom-up approach for patterning of two MOFs, zeolitic imidazolate frameworks (ZIF), ZIF-8 and ZIF-67. A mild pretreatment of metal oxide precursors with linker vapor leads to the sensitization of the oxide surface to e-beam irradiation, effectively inhibiting subsequent conversion of the oxide to ZI ...[more]

PMID: 35058452

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