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Tungsten Doped TiO2 with Enhanced Photocatalytic and Optoelectrical Properties via Aerosol Assisted Chemical Vapor Deposition.


ABSTRACT: Tungsten doped titanium dioxide films with both transparent conducting oxide (TCO) and photocatalytic properties were produced via aerosol-assisted chemical vapor deposition of titanium ethoxide and dopant concentrations of tungsten ethoxide at 500?°C from a toluene solution. The films were anatase TiO2, with good n-type electrical conductivities as determined via Hall effect measurements. The film doped with 2.25 at.% W showed the lowest resistivity at 0.034??.cm and respectable charge carrier mobility (14.9?cm(3)/V.s) and concentration (×10(19)?cm(-3)). XPS indicated the presence of both W(6+) and W(4+) in the TiO2 matrix, with the substitutional doping of W(4+) inducing an expansion of the anatase unit cell as determined by XRD. The films also showed good photocatalytic activity under UV-light illumination, with degradation of resazurin redox dye at a higher rate than with undoped TiO2.

SUBMITTER: Sathasivam S 

PROVIDER: S-EPMC4650706 | biostudies-other | 2015

REPOSITORIES: biostudies-other

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Tungsten Doped TiO2 with Enhanced Photocatalytic and Optoelectrical Properties via Aerosol Assisted Chemical Vapor Deposition.

Sathasivam Sanjayan S   Bhachu Davinder S DS   Lu Yao Y   Chadwick Nicholas N   Althabaiti Shaeel A SA   Alyoubi Abdulrahman O AO   Basahel Sulaiman N SN   Carmalt Claire J CJ   Parkin Ivan P IP  

Scientific reports 20150604


Tungsten doped titanium dioxide films with both transparent conducting oxide (TCO) and photocatalytic properties were produced via aerosol-assisted chemical vapor deposition of titanium ethoxide and dopant concentrations of tungsten ethoxide at 500 °C from a toluene solution. The films were anatase TiO2, with good n-type electrical conductivities as determined via Hall effect measurements. The film doped with 2.25 at.% W showed the lowest resistivity at 0.034 Ω.cm and respectable charge carrier  ...[more]

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