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Turn on the super-elastic collision nature of coronal mass ejections through low approaching speed.

ABSTRACT: It has been proved from the observations and numerical simulations that the collision between solar coronal mass ejections (CMEs), the largest plasmoids in the heliosphere, could be super-elastic. This finding suggests that the CMEs' magnetic energy and thermal energy could be converted into kinetic energy through a more efficient way. However CME collisions are not always super-elastic, which means that this distinct property of plasmoids is probably excited conditionally. As the first attempt, we carry out a series of three-dimensional numerical experiments, and establish a diagram showing the dependence of the collision nature on the CME speed and k-number, the ratio of the CME's kinetic energy to the CME's total energy. It is found that the super-elastic nature of CMEs appears at the relatively low approaching speed, and most of the previous case studies are in agreement with this diagram. Our study firmly advances the understanding of the super-elastic property of plasmoids, and does give us new clues to deeply understand why and how the magnetic energy and/or thermal energy of the colliding plasmoids can be converted into kinetic energy in such an efficient way.

SUBMITTER: Shen F

PROVIDER: S-EPMC4726229 | biostudies-other | 2016

REPOSITORIES: biostudies-other

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Project description:Resists that enable high-throughput and high-resolution patterning are essential in driving the semiconductor technology forward. The ultimate patterning performance of a resist in lithography is limited because of the trade-off between resolution, line-width roughness, and sensitivity; improving one or two of these parameters typically leads to a loss in the third. As the patterned feature sizes approach angstrom scale, the trade-off between these three metrics becomes increasingly hard to resolve and calls for a fundamental rethinking of the resist chemistry. Low-molecular-mass monodispersed metal-containing resists of high atom economy can provide not only very high resolution but also very low line-width roughness without sacrificing sensitivity. Here we describe a modular metal-containing resist platform (molecular mass <500 Da) where a molecular resist consists of just two components: a metal and a radical initiator bonded to it. This simple system not only is amenable to high-resolution electron beam lithography (EBL) and extreme ultraviolet lithography (EUVL) but also unites them mechanistically, giving a consolidated perspective of molecular and chemical processes happening during exposure. Irradiation of the resist leads to the production of secondary electrons that generate radicals in the initiator bonded to metal. This brings about an intramolecular rearrangement and causes solubility switch in the exposed resist. We demonstrate record 1.9-2.0 nm isolated patterns and 7 nm half-pitch dense line-space features over a large area using EBL. With EUVL, 12 nm half-pitch line-space features are shown at a dose of 68 mJ/cm2. In both of these patterning techniques, the line-width roughness was found to be ≤2 nm, a record low value for any resist platform, also leading to a low-performance trade-off metric, Z factor, of 0.6 × 10-8 mJ·nm3. With the ultimate resolution limited by instrumental factors, potential patterning at the level of a unit cell can be envisaged, making low-molecular-mass resists best poised for angstrom-scale lithography.

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Turn on the super-elastic collision nature of coronal mass ejections through low approaching speed.

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