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Towards do-it-yourself planar optical components using plasmon-assisted etching.

ABSTRACT: In recent years, the push to foster increased technological innovation and basic scientific and engineering interest from the broadest sectors of society has helped to accelerate the development of do-it-yourself (DIY) components, particularly those related to low-cost microcontroller boards. The attraction with DIY kits is the simplification of the intervening steps going from basic design to fabrication, albeit typically at the expense of quality. We present herein plasmon-assisted etching as an approach to extend the DIY theme to optics, specifically the table-top fabrication of planar optical components. By operating in the design space between metasurfaces and traditional flat optical components, we employ arrays of Au pillar-supported bowtie nanoantennas as a template structure. To demonstrate, we fabricate a Fresnel zone plate, diffraction grating and holographic mode converter--all using the same template. Applications to nanotweezers and fabricating heterogeneous nanoantennas are also shown.

SUBMITTER: Chen H

PROVIDER: S-EPMC4737853 | biostudies-other | 2016

REPOSITORIES: biostudies-other

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Towards do-it-yourself planar optical components using plasmon-assisted etching.

Chen Hao H Bhuiya Abdul M AM Ding Qing Q Johnson Harley T HT Toussaint Kimani C KC

Nature communications 20160127

In recent years, the push to foster increased technological innovation and basic scientific and engineering interest from the broadest sectors of society has helped to accelerate the development of do-it-yourself (DIY) components, particularly those related to low-cost microcontroller boards. The attraction with DIY kits is the simplification of the intervening steps going from basic design to fabrication, albeit typically at the expense of quality. We present herein plasmon-assisted etching as ...[more]

PMID: 26814026

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Project description:The combination of metal-assisted chemical etching (MACE) with colloidal lithography has emerged as a simple and cost-effective approach to nanostructure silicon. It is especially efficient at synthesizing Si micro- and nanowire arrays using a catalytic metal mesh, which sinks into the silicon substrate during the etching process. The approach provides a precise control over the array geometry, without requiring expensive nanopatterning techniques. Although MACE is a high-throughput solution-based approach, achieving large-scale homogeneity can be challenging because of the instability of the metal catalyst when the experimental parameters are not set appropriately. Such instabilities can lead to metal film fracture, significantly damaging the substrate and thus compromising the nanowire array quality. Here, we report on the critical parameters that influence the stability of the metal catalyst layer for achieving large-scale homogeneous MACE: etchant composition, metal film thickness, adhesion layer thickness, nanowire diameter and pitch, metal film coverage, Si/Au/etchant interface length, and crystalline quality of the colloidal template (grain size and defects). Our results investigate the origin of the catalyst film fracture and reveal that MACE experiments should be optimized for each Si wire array geometry by keeping the etch rate below a certain threshold. We show that the Si/Au/etchant interface length also affects the etch rate and should thus be considered when optimizing the MACE experimental parameters. Finally, our results demonstrate that colloidal templates with small grain sizes (i.e., <100 μm2) can yield significant problems during the pattern transfer because of a high density of defects at the grain boundaries that negatively affects the metal film stability. As such, this work provides guidelines for the large-scale synthesis of Si micro- and nanowire arrays via MACE, relevant for both new and experienced researchers working with MACE.

Dataset Information

Towards do-it-yourself planar optical components using plasmon-assisted etching.

Publications

Towards do-it-yourself planar optical components using plasmon-assisted etching.

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