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Photoresist Design for Elastomeric Light Tunable Photonic Devices.

ABSTRACT: An increasing interest in tunable photonic structures is growing within the photonic community. The usage of Liquid Crystalline Elastomer (LCE) structures in the micro-scale has been motivated by the potential to remotely control their properties. In order to design elastic photonic structures with a three-dimensional lithographic technique, an analysis of the different mixtures used in the micro-printing process is required. Previously reported LCE microstructures suffer damage and strong swelling as a limiting factor of resolution. In this article, we reported a detailed study on the writing process with four liquid crystalline photoresists, in which the percentage of crosslinker is gradually increased. The experiments reveal that exploiting the crosslinking degree is a possible means in which to obtain suspended lines with good resolution, quite good rigidity, and good elasticity, thereby preserving the possibility of deformation by light irradiation.

SUBMITTER: Nocentini S

PROVIDER: S-EPMC5456896 | biostudies-other | 2016 Jun

REPOSITORIES: biostudies-other

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Photoresist Design for Elastomeric Light Tunable Photonic Devices.

Nocentini Sara S Martella Daniele D Parmeggiani Camilla C Wiersma Diederik S DS

Materials (Basel, Switzerland) 20160629 7

An increasing interest in tunable photonic structures is growing within the photonic community. The usage of Liquid Crystalline Elastomer (LCE) structures in the micro-scale has been motivated by the potential to remotely control their properties. In order to design elastic photonic structures with a three-dimensional lithographic technique, an analysis of the different mixtures used in the micro-printing process is required. Previously reported LCE microstructures suffer damage and strong swell ...[more]

PMID: 28773646

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