Browse
Submit Data
Databases
API
Help

Dataset Information

27 Views

0 Connections

0 Citations

0 Reanalyses

0 Downloads

Omics score: 0

Maskless plasmonic lithography at 22 nm resolution.

ABSTRACT: Optical imaging and photolithography promise broad applications in nano-electronics, metrologies, and single-molecule biology. Light diffraction however sets a fundamental limit on optical resolution, and it poses a critical challenge to the down-scaling of nano-scale manufacturing. Surface plasmons have been used to circumvent the diffraction limit as they have shorter wavelengths. However, this approach has a trade-off between resolution and energy efficiency that arises from the substantial momentum mismatch. Here we report a novel multi-stage scheme that is capable of efficiently compressing the optical energy at deep sub-wavelength scales through the progressive coupling of propagating surface plasmons (PSPs) and localized surface plasmons (LSPs). Combining this with airbearing surface technology, we demonstrate a plasmonic lithography with 22 nm half-pitch resolution at scanning speeds up to 10 m/s. This low-cost scheme has the potential of higher throughput than current photolithography, and it opens a new approach towards the next generation semiconductor manufacturing.

SUBMITTER: Pan L

PROVIDER: S-EPMC3240963 | biostudies-literature |

REPOSITORIES: biostudies-literature

ACCESS DATA

Json Xml

Similar Datasets

Fast Acoustic Light Sculpting for On-Demand Maskless Lithography.

Project description:Light interference is the primary enabler of a number of optical maskless techniques for the large-scale processing of materials at the nanoscale. However, methods controlling interference phenomena can be limited in speed, ease of implementation, or the selection of pattern designs. Here, an optofluidic system that employs acoustic standing waves in a liquid to produce complex interference patterns at sub-microsecond temporal resolution, faster than the pulse-to-pulse period of many commercial laser systems, is presented. By controlling the frequency of the acoustic waves and the motion of a translation stage, additive and subtractive direct-writing of tailored patterns over cm2 areas with sub-wavelength uniformity in periodicity and scalable spatial resolution, down to the nanometric range, are demonstrated. Such on-the-fly dynamic control of light enhances throughput and design flexibility of optical maskless lithography, helping to expand its application portfolio to areas as important as plasmonics, electronics, or metamaterials.

| S-EPMC6662050 | biostudies-literature

A versatile diffractive maskless lithography for single-shot and serial microfabrication.

Project description:We demonstrate a diffractive maskless lithographic system that is capable of rapidly performing both serial and single-shot micropatterning. Utilizing the diffractive properties of phase holograms displayed on a spatial light modulator, arbitrary intensity distributions were produced to form two and three dimensional micropatterns/structures in a variety of substrates. A straightforward graphical user interface was implemented to allow users to load templates and change patterning modes within the span of a few minutes. A minimum resolution of approximately 700 nm is demonstrated for both patterning modes, which compares favorably to the 232 nm resolution limit predicted by the Rayleigh criterion. The presented method is rapid and adaptable, allowing for the parallel fabrication of microstructures in photoresist as well as the fabrication of protein microstructures that retain functional activity.

| S-EPMC2920747 | biostudies-literature

Programmable gradational micropatterning of functional materials using maskless lithography controlling absorption.

Project description:The demand for patterning functional materials precisely on surfaces of stimuli-responsive devices has increased in many research fields. In situ polymerization technology is one of the most convenient ways to place the functional materials on a desired location with micron-scale accuracy. To fabricate stimuli-responsive surfaces, controlling concentration of the functional material is much as important as micropatterning them. However, patterning and controlling concentration of the functional materials simultaneously requires an additional process, such as preparing multiple co-flow microfluidic structures and numbers of solutions with various concentrations. Despite applying these processes, fabricating heterogeneous patterns in large scale (millimeter scale) is still impossible. In this study, we propose an advanced in situ polymerization technique to pattern the surface in micron scale in a concentration-controlled manner. Because the concentration of the functional materials is manipulated by self-assembly on the surface, a complex pattern could be easily fabricated without any additional procedure. The complex pattern is pre-designed with absorption amount of the functional material, which is pre-determined by the duration of UV exposure. We show that the resolution reaches up to 2.5??m and demonstrate mm-scale objects, maintaining the same resolution. We also fabricated Multi-bit barcoded micro particles verify the flexibility of our system.

| S-EPMC4615026 | biostudies-literature

Manipulating the light-matter interactions in plasmonic nanocavities at 1 nm spatial resolution.

Project description:The light-matter interaction between plasmonic nanocavity and exciton at the sub-diffraction limit is a central research field in nanophotonics. Here, we demonstrated the vertical distribution of the light-matter interactions at ~1 nm spatial resolution by coupling A excitons of MoS2 and gap-mode plasmonic nanocavities. Moreover, we observed the significant photoluminescence (PL) enhancement factor reaching up to 2800 times, which is attributed to the Purcell effect and large local density of states in gap-mode plasmonic nanocavities. Meanwhile, the theoretical calculations are well reproduced and support the experimental results.

| S-EPMC9325739 | biostudies-literature

Plasmonic nanostructures through DNA-assisted lithography.

Project description:Programmable self-assembly of nucleic acids enables the fabrication of custom, precise objects with nanoscale dimensions. These structures can be further harnessed as templates to build novel materials such as metallic nanostructures, which are widely used and explored because of their unique optical properties and their potency to serve as components of novel metamaterials. However, approaches to transfer the spatial information of DNA constructions to metal nanostructures remain a challenge. We report a DNA-assisted lithography (DALI) method that combines the structural versatility of DNA origami with conventional lithography techniques to create discrete, well-defined, and entirely metallic nanostructures with designed plasmonic properties. DALI is a parallel, high-throughput fabrication method compatible with transparent substrates, thus providing an additional advantage for optical measurements, and yields structures with a feature size of ~10 nm. We demonstrate its feasibility by producing metal nanostructures with a chiral plasmonic response and bowtie-shaped nanoantennas for surface-enhanced Raman spectroscopy. We envisage that DALI can be generalized to large substrates, which would subsequently enable scale-up production of diverse metallic nanostructures with tailored plasmonic features.

| S-EPMC5804581 | biostudies-literature

Direct-write maskless lithography of LBL nanocomposite films and its prospects for MEMS technologies.

Project description:Application of nanocomposites in MEMS, flexible electronics, and biomedical devices is likely to demonstrate new performance standards and resolve a number of difficult technical problems enabled by the unique combinations of electrical, optical, and mechanical properties. This study explores the possibility of making microscale nanocomposite patterns using the fusion of two highly versatile techniques: direct-write maskless UV patterning and layer-by-layer assembly (LBL). Together they can be applied to the production of a wide variety of nanostructured coatings with complex patterns. Single-walled carbon nanotube (SWNT) and gold nanoparticle LBL nanocomposites assembled with chitosan (CH) were made into prototypical patterns such as concentric helices and bus-line-and-stimulation-pads (BLASPs) used in flexible antennas and neuroprosthetic devices. The spatial resolution of the technique was established with the standard line grids to be at least 1 ?m. Gold nanoparticle films revealed better accuracy and higher resolution in direct-write patterning than SWNT composites, possibly due to the granular rather than fibrous nature of the composites. The conductivity of the patterned composites was 6.45 × 10(-5)? m and 3.80 × 10(-6)? m at 20 °C for nanotube and nanoparticle composites, respectively; in both cases it exceeds electrical parameters of similar composites. Fundamental and technological prospects of nanocomposite MEMS devices in different areas including implantable biomedical, sensing, and optical devices are discussed.

| S-EPMC3427742 | biostudies-literature

Maskless Lithography and in situ Visualization of Conductivity of Graphene using Helium Ion Microscopy.

Project description:The remarkable mechanical and electronic properties of graphene make it an ideal candidate for next generation nanoelectronics. With the recent development of commercial-level single-crystal graphene layers, the potential for manufacturing household graphene-based devices has improved, but significant challenges still remain with regards to patterning the graphene into devices. In the case of graphene supported on a substrate, traditional nanofabrication techniques such as e-beam lithography (EBL) are often used in fabricating graphene nanoribbons but the multi-step processes they require can result in contamination of the graphene with resists and solvents. In this letter, we report the utility of scanning helium ion lithography for fabricating functional graphene nanoconductors that are supported directly on a silicon dioxide layer, and we measure the minimum feature size achievable due to limitations imposed by thermal fluctuations and ion scattering during the milling process. Further we demonstrate that ion beams, due to their positive charging nature, may be used to observe and test the conductivity of graphene-based nanoelectronic devices in situ.

| S-EPMC4493665 | biostudies-literature

Sub-100 nm patterning of supported bilayers by nanoshaving lithography.

Project description:Sub-100 nm wide supported phospholipid bilayers (SLBs) were patterned on a planar borosilicate substrate by AFM-based nanoshaving lithography. First, a bovine serum albumin monolayer was coated on the glass and then selectively removed in long strips by an AFM tip. The width of vacant strips could be controlled down to 15 nm. Bilayer lines could be formed within the vacant strips by vesicle fusion. It was found that stable bilayers formed by this method had a lower size limit of approximately 55 nm in width. This size limit stems from a balance between a favorable bilayer adhesion energy and an unfavorable bilayer edge energy.

| S-EPMC3475159 | biostudies-literature

Self-aligned colloidal lithography for controllable and tuneable plasmonic nanogaps.

Project description:Au nanoparticles (NPs) deposited on a substrate function as ring shaped colloidal shadow masks. Using e-beam evaporation of gold, nanometer sized gaps are formed as a result. The size of these gaps can be accurately tuned by controlling the thickness of the gold deposition, thereby tuning the plasmonic coupling of the NPs with the substrate. The clean cavity produced between the Au NPs and the Au film provides an excellent SERS platform for trace molecule detection.

| S-EPMC4515099 | biostudies-literature

Sub-15-nm patterning of asymmetric metal electrodes and devices by adhesion lithography.

Project description:Coplanar electrodes formed from asymmetric metals separated on the nanometre length scale are essential elements of nanoscale photonic and electronic devices. Existing fabrication methods typically involve electron-beam lithography--a technique that enables high fidelity patterning but suffers from significant limitations in terms of low throughput, poor scalability to large areas and restrictive choice of substrate and electrode materials. Here, we describe a versatile method for the rapid fabrication of asymmetric nanogap electrodes that exploits the ability of selected self-assembled monolayers to attach conformally to a prepatterned metal layer and thereby weaken adhesion to a subsequently deposited metal film. The method may be carried out under ambient conditions using simple equipment and a minimum of processing steps, enabling the rapid fabrication of nanogap electrodes and optoelectronic devices with aspect ratios in excess of 100,000.

| S-EPMC4050269 | biostudies-literature

OmicsDI is part of the ELIXIR infrastructure

OmicsDI is an Elixir interoperability service. Learn more ›

OmicsDI Databases

PRIDE
PeptideAtlas
MassIVE
JPOST Repository
Physiome Model Repository

EGA
EVA
ENA
LINCS
PAXDB
Cell Collective

MetaboLights
Metabolomics Workbench
MetabolomeExpress
GNPS
BioModels
FAIRDOMHub

ArrayExpress
dbGaP
ExpressionAtlas
GEO
NODE

Information

Databases
Help
API
Contact us
Code on GitHub
Terms of use
Submit Data