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Direct-write maskless lithography of LBL nanocomposite films and its prospects for MEMS technologies.

ABSTRACT: Application of nanocomposites in MEMS, flexible electronics, and biomedical devices is likely to demonstrate new performance standards and resolve a number of difficult technical problems enabled by the unique combinations of electrical, optical, and mechanical properties. This study explores the possibility of making microscale nanocomposite patterns using the fusion of two highly versatile techniques: direct-write maskless UV patterning and layer-by-layer assembly (LBL). Together they can be applied to the production of a wide variety of nanostructured coatings with complex patterns. Single-walled carbon nanotube (SWNT) and gold nanoparticle LBL nanocomposites assembled with chitosan (CH) were made into prototypical patterns such as concentric helices and bus-line-and-stimulation-pads (BLASPs) used in flexible antennas and neuroprosthetic devices. The spatial resolution of the technique was established with the standard line grids to be at least 1 ?m. Gold nanoparticle films revealed better accuracy and higher resolution in direct-write patterning than SWNT composites, possibly due to the granular rather than fibrous nature of the composites. The conductivity of the patterned composites was 6.45 × 10(-5)? m and 3.80 × 10(-6)? m at 20 °C for nanotube and nanoparticle composites, respectively; in both cases it exceeds electrical parameters of similar composites. Fundamental and technological prospects of nanocomposite MEMS devices in different areas including implantable biomedical, sensing, and optical devices are discussed.

SUBMITTER: Bai Y

PROVIDER: S-EPMC3427742 | biostudies-literature | 2012 Aug

REPOSITORIES: biostudies-literature

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Direct-write maskless lithography of LBL nanocomposite films and its prospects for MEMS technologies.

Bai Yongxiao Y Ho Szushen S Kotov Nicholas A NA

Nanoscale 20120627 15

Application of nanocomposites in MEMS, flexible electronics, and biomedical devices is likely to demonstrate new performance standards and resolve a number of difficult technical problems enabled by the unique combinations of electrical, optical, and mechanical properties. This study explores the possibility of making microscale nanocomposite patterns using the fusion of two highly versatile techniques: direct-write maskless UV patterning and layer-by-layer assembly (LBL). Together they can be a ...[more]

PMID: 22740054

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Project description:Plasmonic lithography, which uses the evanescent electromagnetic (EM) fields to generate image beyond the diffraction limit, has been successfully demonstrated as an alternative lithographic technology for creating sub-10 nm patterns. However, the obtained photoresist pattern contour in general exhibits a very poor fidelity due to the near-field optical proximity effect (OPE), which is far below the minimum requirement for nanofabrication. Understanding the near-field OPE formation mechanism is important to minimize its impact on nanodevice fabrication and improve its lithographic performance. In this work, a point-spread function (PSF) generated by a plasmonic bowtie-shaped nanoaperture (BNA) is employed to quantify the photon-beam deposited energy in the near-field patterning process. The achievable resolution of plasmonic lithography has successfully been enhanced to approximately 4 nm with numerical simulations. A field enhancement factor (F) as a function of gap size is defined to quantitatively evaluate the strong near-field enhancement effect excited by a plasmonic BNA, which also reveals that the high enhancement of the evanescent field is due to the strong resonant coupling between the plasmonic waveguide and the surface plasmon waves (SPWs). However, based on an investigation of the physical origin of the near-field OPE, and the theoretical calculations and simulation results indicate that the evanescent-field-induced rapid loss of high-k information is one of the main optical contributors to the near-field OPE. Furthermore, an analytic formula is introduced to quantitatively analyze the effect of the rapidly decaying feature of the evanescent field on the final exposure pattern profile. Notably, a fast and effective optimization method based on the compensation principle of the exposure dose is proposed to reduce the pattern distortion by modulating the exposure map with dose leveling. The proposed pattern quality enhancement method can open new possibilities in the manufacture of nanostructures with ultrahigh pattern quality via plasmonic lithography, which would find potentially promising applications in high density optical storage, biosensors, and plasmonic nanofocusing.

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Direct-write maskless lithography of LBL nanocomposite films and its prospects for MEMS technologies.

Publications

Direct-write maskless lithography of LBL nanocomposite films and its prospects for MEMS technologies.

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