Dry lithography of large-area, thin-film organic semiconductors using frozen CO(2) resists.
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ABSTRACT:
SUBMITTER: Bahlke ME
PROVIDER: S-EPMC3546373 | biostudies-literature | 2012 Dec
REPOSITORIES: biostudies-literature
Publications
Dry lithography of large-area, thin-film organic semiconductors using frozen CO(2) resists.
Bahlke Matthias E ME Mendoza Hiroshi A HA Ashall Daniel T DT Yin Allen S AS Baldo Marc A MA
Advanced materials (Deerfield Beach, Fla.) 20120911 46
To address the incompatibility of organic semiconductors with traditional photolithography, an inert, frozen CO(2) resist is demonstrated that forms an in situ shadow mask. Contact with a room-temperature micro-featured stamp is used to pattern the resist. After thin film deposition, the remaining CO(2) is sublimed to lift off unwanted material. Pixel densities of 325 pixels-per-inch are shown. ...[more]
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