Ontology highlight
ABSTRACT:
SUBMITTER: Mohammad MA
PROVIDER: S-EPMC3617037 | biostudies-literature | 2013 Mar
REPOSITORIES: biostudies-literature
Mohammad Mohammad Ali MA Dew Steven K SK Stepanova Maria M
Nanoscale research letters 20130327 1
A detailed process characterization of SML electron beam resist for high-aspect-ratio nanopatterning at high sensitivity is presented. SML contrast curves were generated for methyl isobutyl ketone (MIBK), MIBK/isopropyl alcohol (IPA) (1:3), IPA/water (7:3), n-amyl acetate, xylene, and xylene/methanol (3:1) developers. Using IPA/water developer, the sensitivity of SML was improved considerably and found to be comparable to benchmark polymethylmethacrylate (PMMA) resist without affecting the aspec ...[more]