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Negative-tone molecular glass photoresist for high-resolution electron beam lithography.

ABSTRACT: A low molecular weight organic compound containing bis-phenol A backbone (BPA-6OH) is reported as a negative-tone photoresist. This material has a high glass transition temperature and excellent thermal stability. A good contrast, well-resolved line pattern around 73.4 nm and sensitivity of 52 µC cm^-2 can be received for negative-tone molecular glass photoresist upon exposure in electron beam lithography system. It indicates that the negative-tone molecular glass photoresist is one of the promising candidates for use in electron beam lithography.

SUBMITTER: Wang Y

PROVIDER: S-EPMC8074933 | biostudies-literature | 2021 Mar

REPOSITORIES: biostudies-literature

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Negative-tone molecular glass photoresist for high-resolution electron beam lithography.

Wang Yafei Y Chen Long L Yu Jiating J Guo Xudong X Wang Shuangqing S Yang Guoqiang G

Royal Society open science 20210303 3

A low molecular weight organic compound containing bis-phenol A backbone (BPA-6OH) is reported as a negative-tone photoresist. This material has a high glass transition temperature and excellent thermal stability. A good contrast, well-resolved line pattern around 73.4 nm and sensitivity of 52 µC cm<sup>-2</sup> can be received for negative-tone molecular glass photoresist upon exposure in electron beam lithography system. It indicates that the negative-tone molecular glass photoresist is one of ...[more]

PMID: 33959364

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Negative-tone molecular glass photoresist for high-resolution electron beam lithography.

Publications

Negative-tone molecular glass photoresist for high-resolution electron beam lithography.

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