Ontology highlight
ABSTRACT:
SUBMITTER: Ornoff DM
PROVIDER: S-EPMC3780457 | biostudies-literature | 2013 Feb
REPOSITORIES: biostudies-literature
Ornoff D M DM Wang Y Y Allbritton N L NL
Journal of micromechanics and microengineering : structures, devices, and systems 20130201 2
Photoresists are light-sensitive resins used in a variety of technological applications. In most applications, however, photoresists are generally used as sacrificial layers or a structural layer that remains on the fabrication substrate. Thin layers of patterned 1002F photoresist were fabricated and released to form a freestanding film. Films of thickness in the range of 4.5-250 μm were patterned with through-holes to a resolution of 5 μm and an aspect ratio of up to 6:1. Photoresist films coul ...[more]