Wafer-scale growth of VO2 thin films using a combinatorial approach.
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ABSTRACT: Transition metal oxides offer functional properties beyond conventional semiconductors. Bridging the gap between the fundamental research frontier in oxide electronics and their realization in commercial devices demands a wafer-scale growth approach for high-quality transition metal oxide thin films. Such a method requires excellent control over the transition metal valence state to avoid performance deterioration, which has been proved challenging. Here we present a scalable growth approach that enables a precise valence state control. By creating an oxygen activity gradient across the wafer, a continuous valence state library is established to directly identify the optimal growth condition. Single-crystalline VO2 thin films have been grown on wafer scale, exhibiting more than four orders
SUBMITTER: Zhang HT
PROVIDER: S-EPMC4633718 | biostudies-literature | 2015 Oct
REPOSITORIES: biostudies-literature
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