Ontology highlight
ABSTRACT:
SUBMITTER: Wu ML
PROVIDER: S-EPMC4756386 | biostudies-literature | 2016 Feb
REPOSITORIES: biostudies-literature
Wu Mei-Ling ML Wang Dong D Wan Li-Jun LJ
Nature communications 20160215
Block copolymer (BCP) nanolithography is widely recognized as a promising complementary approach to circumvent the feature size limits of conventional photolithography. The directed self-assembly of BCP thin film to form ordered nanostructures with controlled orientation and localized pattern has been the key challenge for practical nanolithography applications. Here we show that BCP nanopatterns can be directed on localized surface electrets defined by electron-beam irradiation to realize diver ...[more]