Oxidized Monolayers of Epitaxial Silicene on Ag(111).
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ABSTRACT:
SUBMITTER: Johnson NW
PROVIDER: S-EPMC4776149 | biostudies-literature | 2016 Mar
REPOSITORIES: biostudies-literature
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Project description:Silicene is a monolayer allotrope of silicon atoms arranged in a honeycomb structure with massless Dirac fermion characteristics similar to graphene. It merits development of silicon-based multifunctional nanoelectronic and spintronic devices operated at room temperature because of strong spin-orbit coupling. Nevertheless, until now, silicene could only be epitaxially grown on conductive substrates. The strong silicene-substrate interaction may depress its superior electronic properties. We report a quasi-freestanding silicene layer that has been successfully obtained through oxidization of bilayer silicene on the Ag(111) surface. The oxygen atoms intercalate into the underlayer of silicene, resulting in isolation of the top layer of silicene from the substrate. In consequence, the top layer of silicene exhibits the signature of a 1 × 1 honeycomb lattice and hosts massless Dirac fermions because of much less interaction with the substrate. Furthermore, the oxidized silicon buffer layer is expected to serve as an ideal dielectric layer for electric gating in electronic devices. These findings are relevant for the future design and application of silicene-based nanoelectronic and spintronic devices.
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Project description:Epitaxial silicene, which is one single layer of silicon atoms packed in a honeycomb structure, demonstrates a strong interaction with the substrate that dramatically affects its electronic structure. The role of electronic coupling in the chemical reactivity between the silicene and the substrate is still unclear so far, which is of great importance for functionalization of silicene layers. Here, we report the reconstructions and hybridized electronic structures of epitaxial 4 × 4 silicene on Ag(111), which are revealed by scanning tunneling microscopy and angle-resolved photoemission spectroscopy. The hybridization between Si and Ag results in a metallic surface state, which can gradually decay due to oxygen adsorption. X-ray photoemission spectroscopy confirms the decoupling of Si-Ag bonds after oxygen treatment as well as the relatively oxygen resistance of Ag(111) surface, in contrast to 4 × 4 silicene [with respect to Ag(111)]. First-principles calculations have confirmed the evolution of the electronic structure of silicene during oxidation. It has been verified experimentally and theoretically that the high chemical activity of 4 × 4 silicene is attributable to the Si pz state, while the Ag(111) substrate exhibits relatively inert chemical behavior.
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Project description:The synthesis of silicene by direct growth on silver is characterized by the formation of multiple phases and domains, posing severe constraints on the spatial charge conduction towards a technological transfer of silicene to electronic transport devices. Here we engineer the silicene/silver interface by two schemes, namely, either through decoration by Sn atoms, forming an Ag2Sn surface alloy, or by buffering the interface with a stanene layer. Whereas in both cases Raman spectra confirm the typical features as expected from silicene, by electron diffraction we observe that a very well-ordered single-phase 4 × 4 monolayer silicene is stabilized by the decorated surface, while the buffered interface exhibits a sharp phase at all silicon coverages. Both interfaces also stabilize the ordered growth of a phase in the multilayer range, featuring a single rotational domain. Theoretical ab initio models are used to investigate low-buckled silicene phases (4 × 4 and a competing one) and various structures, supporting the experimental findings. This study provides new and promising technology routes to manipulate the silicene structure by controlled phase selection and single-crystal silicene growth on a wafer-scale.
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Project description:We demonstrate, using first-principles molecular-dynamics simulations, that oxidation of silicene can easily take place either at low or high oxygen doses, which importantly helps clarify previous inconsistent reports on the oxidation of silicene on the Ag(111) substrate. We show that, while the energy barrier for an O2 molecule reacting with a Si atom strongly depends on the position and orientation of the molecule, the O2 molecule immediately dissociates and forms an Si-O-Si configuration once it finds a barrier-less chemisorption pathway around an outer Si atom of the silicene overlayer. A synergistic effect between the molecular dissociation and subsequent structural rearrangements is found to accelerate the oxidation process at a high oxygen dose. This effect also enhances self-organized formation of sp(3)-like tetrahedral configurations (consisting of Si and O atoms), which results in collapse of the two-dimensional silicene structure and its exfoliation from the substrate. We also find that the electronic properties of the silicene can be significantly altered by oxidation. The present findings suggest that low flux and low temperature of the oxygen gas are key to controlling oxidation of silicene.
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Project description:The epitaxial growth of silicene has been the subject of many investigations, controversies and non-classical results. In particular, the initially promising deposition of Si on a metallic substrate such as Ag(111) has revealed unexpected growth modes where Si is inserted at the beginning of the growth in the first atomic plane of the substrate. In order to rationalize this anomalous growth mode, we develop an out-of-equilibrium description of a lattice-based epitaxial growth model, which growth dynamics are analyzed via kinetic Monte-Carlo simulations. This model incorporates several effects revealed by the experiments such as the intermixing between Si and Ag, and surface effects. It is parametrized thanks to an approach in which we show that relatively precise estimates of energy barriers can be deduced by meticulous analysis of atomic microscopy images. This analysis enables us to reproduce both qualitatively and quantitatively the anomalous growth patterns of Si on Ag(111). We show that the dynamics results in two modes, a classical sub-monolayer growth mode at low temperature, and an inserted growth mode at higher temperatures, where the deposited Si atoms insert in the first layer of the substrate by replacing Ag atoms. Furthermore, we reproduce the non-standard [Formula: see text] shape of the experimental plot of the island density as a function of temperature, with a shift in island density variation during the transition between the submonoloyer and inserted growth modes.
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Project description:Using ab initio methods, we have investigated the structures and stabilities of Si(N) clusters (N ? 24) on Ag(111) surface as the initial stage of silicene growth. Unlike the dome-shaped graphene clusters, Si clusters prefer nearly flat structures with low buckling, more stable than directly deposition of the 3D freestanding Si clusters on Ag surface. The p-d hybridization between Ag and Si is revealed as well as sp(2) characteristics in Si(N)@Ag(111). Three types of silicene superstructures on Ag(111) surface have been considered and the simulated STM images are compared with experimental observations. Molecular dynamic simulations show high thermal stability of silicene on Ag(111) surfaces, contrast to that on Rh(111). The present theoretical results constitute a comprehensive picture about the interaction mechanism of silicene on Ag(111) surface and explain the superiority of Ag substrate for silicene growth, which would be helpful for improving the experimentally epitaxial growth of silicene.
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