Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications.
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ABSTRACT:
SUBMITTER: Jeong HH
PROVIDER: S-EPMC5115431 | biostudies-literature | 2015 Jul
REPOSITORIES: biostudies-literature
Publications
Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications.
Jeong Hyeon-Ho HH Mark Andrew G AG Lee Tung-Chun TC Son Kwanghyo K Chen Wenwen W Alarcón-Correa Mariana M Kim Insook I Schütz Gisela G Fischer Peer P
Advanced science (Weinheim, Baden-Wurttemberg, Germany) 20150506 7
<b>A parallel nanolithographic patterning method</b> is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch-mask applications. ...[more]
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