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Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications.


ABSTRACT: A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch-mask applications.

SUBMITTER: Jeong HH 

PROVIDER: S-EPMC5115431 | biostudies-literature | 2015 Jul

REPOSITORIES: biostudies-literature

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Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications.

Jeong Hyeon-Ho HH   Mark Andrew G AG   Lee Tung-Chun TC   Son Kwanghyo K   Chen Wenwen W   Alarcón-Correa Mariana M   Kim Insook I   Schütz Gisela G   Fischer Peer P  

Advanced science (Weinheim, Baden-Wurttemberg, Germany) 20150506 7


<b>A parallel nanolithographic patterning method</b> is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch-mask applications. ...[more]

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