Ontology highlight
ABSTRACT:
SUBMITTER: Ma Q
PROVIDER: S-EPMC5482827 | biostudies-literature | 2017 Jun
REPOSITORIES: biostudies-literature
Ma Qiang Q Li Zhuo Ran ZR Yang Lai Shan LS Lin Jing Huang JH Ba Jin J Wang Ze Yu ZY Qi Jun Lei JL Feng Ji Cai JC
Scientific reports 20170623 1
In order to achieve a high-quality joint between SiO<sub>2f</sub>/SiO<sub>2</sub> and metals, it is necessary to address the poor wettability of SiO<sub>2f</sub>/SiO<sub>2</sub> and the high residual stress in SiO<sub>2f</sub>/SiO<sub>2</sub>-Nb joint. Here, we simultaneously realize good wettability and low residual stress in SiO<sub>2f</sub>/SiO<sub>2</sub>-Nb joint by combined method of HF etching treatment and Finite Element Analysis (FEA). After etching treatment, the wettability of E-SiO<s ...[more]