Ontology highlight
ABSTRACT:
SUBMITTER: Chaudhary P
PROVIDER: S-EPMC5686038 | biostudies-literature | 2017 Nov
REPOSITORIES: biostudies-literature
Chaudhary Prachi P Chhokar Vinod V Choudhary Pragati P Kumar Anil A Beniwal Vikas V
AMB Express 20171114 1
A chromium and tannic acid resistance fungal strain was isolated from tannery effluent, and identified as Aspergillus niveus MCC 1318 based on its rDNA gene sequence. The MIC (minimum inhibitory concentration) of the isolate against chromium and tannic acid was found to be 200 ppm and 5% respectively. Optimization of physiochemical parameters for biosorption of chromium and tannic acid degradation was carried out by Plackett-Burman design followed by response surface methodology (RSM). The maxim ...[more]