Ontology highlight
ABSTRACT:
SUBMITTER: Zhong H
PROVIDER: S-EPMC6179974 | biostudies-literature | 2018 Oct
REPOSITORIES: biostudies-literature
Zhong Hao H Ilyas Nasir N Song Yuhao Y Li Wei W Jiang Yadong Y
Nanoscale research letters 20181010 1
Silicon is widely used in semiconductor industry but has poor performance in near-infrared photoelectronic devices because of its high reflectance and band gap limit. In this study, two-step process, deep reactive ion etching (DRIE) method combined with plasma immersion ion implantation (PIII), are used to fabricate microstructured black silicon on the surface of C-Si. These improved surfaces doped with sulfur elements realize a narrower band gap and an enhancement of light absorptance, especial ...[more]