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Giant Electroresistance in Ferroionic Tunnel Junctions.


ABSTRACT: Oxide-based resistive switching devices, including ferroelectric tunnel junctions and resistance random access memory, are promising candidates for the next-generation non-volatile memory technology. In this work, we propose a ferroionic tunnel junction to realize a giant electroresistance. It functions as a ferroelectric tunnel junction at low resistance state and as a Schottky junction at high resistance state, due to interface engineering through the field-induced migration of oxygen vacancies. An extremely large electroresistance with ON/OFF ratios of 5.1×107 at room temperature and 2.1×109 at 10 K is achieved, using an ultrathin BaTiO3-? layer as the ferroelectric barrier and a semiconducting Nb-doped SrTiO3 substrate as the bottom electrode. The results point toward an appealing way for the design of high-performance resistive switching devices based on ultrathin oxide heterostructures by ionic controlled interface engineering.

SUBMITTER: Li J 

PROVIDER: S-EPMC6584484 | biostudies-literature | 2019 Jun

REPOSITORIES: biostudies-literature

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Giant Electroresistance in Ferroionic Tunnel Junctions.

Li Jiankun J   Li Ning N   Ge Chen C   Huang Heyi H   Sun Yuanwei Y   Gao Peng P   He Meng M   Wang Can C   Yang Guozhen G   Jin Kuijuan K  

iScience 20190603


Oxide-based resistive switching devices, including ferroelectric tunnel junctions and resistance random access memory, are promising candidates for the next-generation non-volatile memory technology. In this work, we propose a ferroionic tunnel junction to realize a giant electroresistance. It functions as a ferroelectric tunnel junction at low resistance state and as a Schottky junction at high resistance state, due to interface engineering through the field-induced migration of oxygen vacancie  ...[more]

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