Effects of Annealing Temperature and Ambient on Metal/PtSe2 Contact Alloy Formation.
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ABSTRACT:
SUBMITTER: Mirabelli G
PROVIDER: S-EPMC6812109 | biostudies-literature | 2019 Oct
REPOSITORIES: biostudies-literature
Publications
Effects of Annealing Temperature and Ambient on Metal/PtSe<sub>2</sub> Contact Alloy Formation.
Mirabelli Gioele G Walsh Lee A LA Gity Farzan F Bhattacharjee Shubhadeep S Cullen Conor P CP Ó Coileáin Cormac C Monaghan Scott S McEvoy Niall N Nagle Roger R Hurley Paul K PK Duffy Ray R
ACS omega 20191010 17
Forming gas annealing is a common process step used to improve the performance of devices based on transition-metal dichalcogenides (TMDs). Here, the impact of forming gas anneal is investigated for PtSe<sub>2</sub>-based devices. A range of annealing temperatures (150, 250, and 350 °C) were used both in inert (0/100% H<sub>2</sub>/N<sub>2</sub>) and forming gas (5/95% H<sub>2</sub>/N<sub>2</sub>) environments to separate the contribution of temperature and ambient. The samples are electrically ...[more]
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