Dataset Information

Domain control of carrier density at a semiconductor-ferroelectric interface.

ABSTRACT: Control of charge carrier distribution in a gated channel via a dielectric layer is currently the state of the art in the design of integrated circuits such as field effect transistors. Replacing linear dielectrics with ferroelectrics would ultimately lead to more energy efficient devices as well as the added advantage of the memory function of the gate. Here, we report that the channel-off/channel-on states in a metal/ferroelectric/semiconductor stack are actually transitions from a multi domain state to a single domain state of the ferroelectric under bias. In our approach, there is no a priori assumption on the single or multi-domain nature of the ferroelectric layer that is often neglected in works discussing the ferroelectric-gate effect on channel conductivity interfacing a ferroelectric. We also predict that semiconductor/ferroelectric/semiconductor stacks can function at even lower gate voltages than metal/ferroelectric/semiconductor stacks when an n-type semiconductor is placed between the ferroelectric and the gate metal. Our results suggest the ultimate stability of the multidomain state whenever it interfaces a semiconductor electrode and that a switchable single domain state may not be necessary to achieve effective control of conductivity in a p-type channel. Finally, we discuss some experimental results in the literature in light of our findings.

SUBMITTER: Misirlioglu IB

PROVIDER: S-EPMC4609957 | biostudies-other | 2015

REPOSITORIES: biostudies-other

ACCESS DATA

Similar Datasets

Project description:We analyze the ferroelectric domain-wall induced negative capacitance (NC) effect in Metal-FE-Insulator-Metal (MFIM) and Metal-FE-Insulator-Semiconductor (MFIS) stacks through phase-field simulations by self-consistently solving time-dependent Ginzburg Landau equation, Poisson's equation and semiconductor charge equations. Considering Hf0.5Zr0.5O2 as the ferroelectric material, we study 180° ferroelectric domain formation in MFIM and MFIS stacks and their polarization switching characteristics. Our analysis signifies that the applied voltage-induced polarization switching via soft domain-wall displacement exhibits non-hysteretic characteristics. In addition, the change in domain-wall energy, due to domain-wall displacement, exhibits a long-range interaction and thus, leads to a non-homogeneous effective local negative permittivity in the ferroelectric. Such effects yield an average negative effective permittivity that further provides an enhanced charge response in the MFIM stack, compared to Metal-Insulator-Metal. Furthermore, we show that the domain-wall induced negative effective permittivity is not an intrinsic property of the ferroelectric material and therefore, is dependent on its thickness, the gradient energy coefficient and the in-plane permittivity of the underlying insulator. Similar to the MFIM stack, MFIS stack also exhibits an enhanced charge/capacitance response compared to Metal-Oxide-Semiconductor (MOS) capacitor. Simultaneously, the multi-domain state of the ferroelectric induces non-homogeneous potential in the underlying insulator and semiconductor layer. At low applied voltages, such non-homogeneity leads to the co-existence of electrons and holes in an undoped semiconductor. In addition, we show that with the ferroelectric layer being in the 180° multi-domain state, the minimum potential at the ferroelectric-dielectric interface and hence, the minimum surface potential in the semiconductor, does not exceed the applied voltage (in-spite of the local differential amplification and charge enhancement).

Dataset Information

Domain control of carrier density at a semiconductor-ferroelectric interface.

Similar Datasets

OmicsDI is part of the ELIXIR infrastructure

Tweets