Project description:A novel approach to local functionalization of plasmonic hotspots at gold nanoparticles with biofunctional moieties is reported. It relies on photocrosslinking and attachment of a responsive hydrogel binding matrix by the use of a UV interference field. A thermoresponsive poly(N-isopropylacrylamide)-based (pNIPAAm) hydrogel with photocrosslinkable benzophenone groups and carboxylic groups for its postmodification was employed. UV-laser interference lithography with a phase mask configuration allowed for the generation of a high-contrast interference field that was used for the recording of periodic arrays of pNIPAAm-based hydrogel features with the size as small as 170 nm. These hydrogel arrays were overlaid and attached on the top of periodic arrays of gold nanoparticles, exhibiting a diameter of 130 nm and employed as a three-dimensional binding matrix in a plasmonic biosensor. Such a hybrid material was postmodified with ligand biomolecules and utilized for plasmon-enhanced fluorescence readout of an immunoassay. Additional enhancement of the fluorescence sensor signal by the collapse of the responsive hydrogel binding matrix that compacts the target analyte at the plasmonic hotspot is demonstrated.
Project description:Several fabrication techniques are recently used to produce a nanopattern for sensing, as focused ion beam milling (FIB), e-beam lithography (EBL), nanoimprinting, and soft lithography. Here, interference lithography is explored for the fabrication of large area nanohole arrays in metal films as an efficient, flexible, and scalable production method. The transmission spectra in air of the 1 cm2 substrate were evaluated to study the substrate behavior when hole-size, periodicity, and film thickness are varied, in order to elucidate the best sample for the most effective sensing performance. The efficiency of the nanohole array was tested for bulk sensing and compared with other platforms found in the literature. The sensitivity of ~1000 nm/RIU, achieved with an array periodicity in the visible range, exceeds near infrared (NIR) performances previously reported, and demonstrates that interference lithography is one of the best alternative to other expensive and time-consuming nanofabrication methods.
Project description:In this paper, we demonstrate plasmonic color metasurfaces as large as ∼60 cm2 fabricated by deep UV projection lithography employing an innovative combination of resolution enhancement techniques. Briefly, in addition to the established off-axis dipole illumination, double- and cross-exposure resolution enhancement of lithography, we introduce a novel element, the inclusion of transparent assist features to the mask layout. With this approach, we demonstrate the fabrication of relief arrays having critical dimensions such as 159 nm nanopillars or 210 nm nanoholes with 300 nm pitches, which is near the theoretical resolution limit expressed by the Rayleigh criterion for the 248 nm lithography tool used in this work. The type of surface structure, i.e. nanopillar or nanohole, and their diameters can be tailored simply by changing the width of the assist features included in the mask layout. By coating the obtained nanopatterns with thin layers of either Au or Al, we observe color spectra originating from the phenomenon known as localized surface plasmon resonance (LSPR). We demonstrate the generation of color palettes representing a broad spectral range of colors, and we employ finite element modelling to corroborate the measured LSPR fingerprint spectra. Most importantly, the ∼60 cm2 nanostructure arrays can be written in only a few minutes, which is a tremendous improvement compared to the more established techniques employed for fabricating similar structures.
Project description:We demonstrate a novel detection scheme for the orbital angular momentum (OAM) of light using circular plasmonic lens. Owing to a division-of-amplitude interference phenomenon between the surface plasmon waves and directly transmitted light, specific intensity distributions are formed near the plasmonic lens surface under different OAM excitations. Due to different phase behaviors of the evanescent surface plasmon wave and the direct transmission, interference patterns rotate as the observation plane moves away from the lens surface. The rotation direction is a direct measure of the sign of OAM, while the amount of rotation is linked to the absolute value of the OAM. This OAM detection scheme is validated experimentally and numerically. Analytical expressions are derived to provide insights and explanations of this detection scheme. This work forms the basis for the realization of a compact and integrated OAM detection architect that may significantly benefit optical information processing with OAM states.
Project description:Photocathodes are key elements in high-brightness electron sources and ubiquitous in the operation of large-scale accelerators, although their operation is often limited by their quantum efficiency and lifetime. Here, we propose to overcome these limitations by utilizing direct-laser nanostructuring techniques on copper substrates, improving their efficiency and robustness for next-generation electron photoinjectors. When the surface of a metal is nanoengineered with patterns and particles much smaller than the optical wavelength, it can lead to the excitation of localized surface plasmons that produce hot electrons, ultimately contributing to the overall charge produced. In order to quantify the performance of laser-produced plasmonic photocathodes, we measured their quantum efficiency in a typical electron gun setup. Our experimental results suggest that plasmon-induced hot electrons lead to a significant increase in quantum efficiency, showing an overall charge enhancement factor of at least 4.5 and up to 25. A further increase in their efficiency was observed when combined with semiconductor thin-films deposited over the laser processed surfaces, pointing at potential pathways for further optimization. We demonstrate that simple laser-produced plasmonic photocathodes outperform standard metallic photocathodes, and can be directly produced in-situ at the electron gun level in vacuum environments and without any disruptive intervention. This approach could lead to unprecedented efficient and continuous operation of electron sources, and is useful in many applications across scientific disciplines requiring high average and peak current electron beams.
Project description:We introduce two types of dielectric metasurfaces, consisting of 3 × 3 regions, which manipulate wavefront by different feature heights. Both polarization-dependent and polarization-independent metasurfaces are realized for phase depth of 0 ∼ 2π at 1550 nm, with considerable average transmittance of 80.1 and 85.1 %, respectively. The phase modulation capability can be extended over a broadband range of 1460.1-1618.0 nm for optical communications, by carefully designing nanofeature sizes. Moreover, the entire metasurfaces with nanofeatures of varying heights can be fabricated in a single process by using direct laser writing with high-precision, which is beneficial for mass production and promising in developing efficient and ultracompact devices.
Project description:Large-area gratings play a crucial role in various engineering fields. However, traditional interference lithography is limited by the size of optical component apertures, making large-area fabrication a challenging task. Here, a method for fabricating laser interference lithography pattern arrays with a global alignment reference strategy is proposed. This approach enables alignment of each area of the laser interference lithography pattern arrays, including phase, period, and tilt angle. Two reference gratings are utilized: one is detached from the substrate, while the other remains fixed to it. To achieve global alignment, the exposure area is adjusted by alternating between moving the beam and the substrate. In our experiment, a 3 × 3 regions grating array was fabricated, and the -1st-order diffraction wavefront measured by the Fizeau interferometer exhibited good continuity. This technique enables effective and efficient alignment with high accuracy across any region in an interference lithography pattern array on large substrates. It can also serve as a common technique for fabricating various types of periodic structures by rotating the substrate.
Project description:Two-dimensional photonic structures such as nanostructured pillar gratings are useful for various applications including wave coupling, diffractive optics, and security features. Two-photon lithography facilitates the generation of such nanostructured surfaces with high precision and reproducibility. In this work, we report on nanopillar diffraction gratings fabricated by two-photon lithography with various laser powers close to the polymerization threshold of the photoresist. As a result, defect-free arrays of pillars with diameters down to 184 nm were fabricated. The structure sizes were analyzed by scanning electron microscopy and compared to theoretical predictions obtained from Monte Carlo simulations. The optical reflectivities of the nanopillar gratings were analyzed by optical microscopy and verified by rigorous coupled-wave simulations.
Project description:Salvinia leaves represent an extraordinary example of how nature found a strategy for the long term retainment of air, and thus oxygen, on a surface, the so-called 'Salvinia effect', thanks to the peculiar three-dimensional and hierarchical shape of the hairs covering the leaves. Here, starting from the natural model, we have microfabricated hairs inspired by those present on the Salvinia molesta leaves, by means of direct laser lithography. Artificial hairs, like their natural counterpart, are composed of a stalk and a crown-like head, and have been reproduced in the microscale since this ensures, if using a proper design, an air-retaining behavior even if the bulk structural material is hydrophilic. We have investigated the capability of air retainment inside the heads of the hairs that can last up to 100 h, demonstrating the stability of the phenomenon. For a given dimension of the head, the greater the number of filaments, the greater the amount of air that can be trapped inside the heads since the increase in the number of solid⁻air interfaces able to pin the liquid phase. For this reason, such type of pattern could be used for the fabrication of surfaces for controlled gas retainment and gas release in liquid phases. The range of applications would be quite large, including industrial, medical, and biological fields.
Project description:The combination of direct laser interference patterning (DLIP) with laser-induced periodic surface structures (LIPSS) enables the fabrication of functional surfaces reported for a wide spectrum of materials. The process throughput is usually increased by applying higher average laser powers. However, this causes heat accumulation impacting the roughness and shape of produced surface patterns. Consequently, the effect of substrate temperature on the topography of fabricated features requires detailed investigations. In this study, steel surfaces were structured with line-like patterns by ps-DLIP at 532 nm. To investigate the influence of substrate temperature on the resulting topography, a heating plate was used to adjust the temperature. Heating to 250 [Formula: see text]C led to a significant reduction of the produced structure depths, from 2.33 to 1.06 µm. The reduction is associated with the appearance of a different LIPSS type, depending on the grain orientation of the substrates and laser-induced superficial oxidation. This study revealed a strong effect of substrate temperature, which is also to be expected when heat accumulation effects arise from processing surfaces at high average laser power.