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A target site for spontaneous insertion of IS10 element in pUC19 DNA located within intrinsically bent DNA.


ABSTRACT: Residual insertion sequence elements (IS elements) in Escherichia coli strains that are commonly used for DNA cloning are known to cause cloning artifacts by transposing themselves into the recombinant DNA fragments. In such cases, chance insertion of IS elements may occur at integration sites in the cloning targets, which in the case of the IS10 element is a 9-bp consensus sequence. We report here that the integration of IS10-related DNA sequences into the pUC19 cloning vector and its derivative occurred with considerable frequency in E. coli strains JM107 and DH10B, with duplication of a 9-bp segment (TCTAAAGTA). Notably, native polyacrylamide gel electrophoresis revealed that intrinsically bent DNA flanks the insertion site.

SUBMITTER: Kobori S 

PROVIDER: S-EPMC2758499 | biostudies-literature | 2009 Sep

REPOSITORIES: biostudies-literature

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A target site for spontaneous insertion of IS10 element in pUC19 DNA located within intrinsically bent DNA.

Kobori Shungo S   Ko Yumi Y   Kato Mikio M  

The open microbiology journal 20090925


Residual insertion sequence elements (IS elements) in Escherichia coli strains that are commonly used for DNA cloning are known to cause cloning artifacts by transposing themselves into the recombinant DNA fragments. In such cases, chance insertion of IS elements may occur at integration sites in the cloning targets, which in the case of the IS10 element is a 9-bp consensus sequence. We report here that the integration of IS10-related DNA sequences into the pUC19 cloning vector and its derivativ  ...[more]

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