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Application of three-dimensionally area-selective atomic layer deposition for selectively coating the vertical surfaces of standing nanopillars.

ABSTRACT: We describe a strategy for selectively coating the vertical surfaces of standing nanopillars using area-selective atomic layer deposition (ALD). Hydrophobic self-assembled monolayers (SAMs) are utilised to selectively inhibit the coating of oxides on the modified horizontal regions to ensure that only the vertical surfaces of vertical standing nanorods are coated using ALD processes. This method makes it possible to fabricate vertical nanodevices using a simple process of depositing oxide layer on a vertical surface, and can also be applied to the area-selective surface passivation of other standing structures.

SUBMITTER: Dong W

PROVIDER: S-EPMC3964512 | biostudies-literature | 2014 Mar

REPOSITORIES: biostudies-literature

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Application of three-dimensionally area-selective atomic layer deposition for selectively coating the vertical surfaces of standing nanopillars.

Dong Wenjing W Zhang Kenan K Zhang Yun Y Wei Tiaoxing T Sun Yan Y Chen Xin X Dai Ning N

Scientific reports 20140325

We describe a strategy for selectively coating the vertical surfaces of standing nanopillars using area-selective atomic layer deposition (ALD). Hydrophobic self-assembled monolayers (SAMs) are utilised to selectively inhibit the coating of oxides on the modified horizontal regions to ensure that only the vertical surfaces of vertical standing nanorods are coated using ALD processes. This method makes it possible to fabricate vertical nanodevices using a simple process of depositing oxide layer ...[more]

PMID: 24662775

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