Fabrication of 200 nm period hard X-ray phase gratings.

ABSTRACT: Far field X-ray grating interferometry achieves extraordinary phase sensitivity in imaging weakly absorbing samples, provided that the grating period is within the transverse coherence length of the X-ray source. Here we describe a cost-efficient process to fabricate large area, 100 nm half-pitch hard X-ray phase gratings with an aspect ratio of 32. The nanometric gratings are suitable for ordinary compact X-ray sources having low spatial coherence, as demonstrated by X-ray diffraction experiments.

SUBMITTER: Miao H 

PROVIDER: S-EPMC4055044 | biostudies-literature | 2014 Jun

REPOSITORIES: biostudies-literature